Methods and Apparatus Providing a Substrate Having a Coating with an Elastic Modulus Gradient

• US 20150037554A1
• Filed: 07/29/2014
• Published: 02/05/2015
• Est. Priority Date: 08/01/2013
• Status: Active Grant

• Current Assignee: Corning Incorporated
• Original Assignee: Corning Incorporated
• Inventors: Gao, Zhanjun, Truitt, Ralph Edward, Hu, Guangli
• Granted Patent: US 9,776,913 B2
• Time in Patent Office: Days
• US Class Current: 428/217
• CPC Class Codes: C03C 17/22 with other inorganic material C03C17/34, C03C17/44 take precedence
• CPC Class Codes: C03C 17/225 Nitrides
• CPC Class Codes: C03C 17/23 Oxides C03C17/02 takes precedence
• CPC Class Codes: C03C 2217/231 In2O3/SnO2
• CPC Class Codes: C03C 2217/91 Coatings containing at least one layer having a composition gradient through its thickness
• CPC Class Codes: C03C 2217/948 Layers comprising indium tin oxide [ITO]
• CPC Class Codes: Y10T 428/24983 Hardness

Abstract

Methods and apparatus are provide for: a substrate having first and second opposing surfaces, and an elastic modulus; and layer(s) having a thickness between first and second opposing surfaces thereof, the first surface of the layer contacting the second surface of the substrate, forming an interface. The layer may exhibit one or more of: a first elastic modulus proximate to the first surface thereof and a second elastic modulus proximate to the second surface thereof, the second elastic modulus being substantially higher than the elastic modulus value, the first elastic modulus being lower than the elastic modulus of the substrate, the second elastic modulus being higher than the elastic modulus of the substrate, and the layer exhibiting an increasing elastic modulus gradient through the thickness thereof from the first elastic modulus to the second elastic modulus.

Claims

1. An apparatus, comprising:

a substrate having first and second opposing surfaces, and an elastic modulus; and

at least one layer having a thickness between first and second opposing surfaces thereof, where the first surface of the layer contacts the second surface of the substrate thereby forming an interface,

wherein;

(i) the layer exhibits a first elastic modulus proximate to the first surface thereof and a second elastic modulus proximate to the second surface thereof, (ii) the second elastic modulus is substantially higher than the first elastic modulus, (iii) the first elastic modulus is lower than the elastic modulus of the substrate, (iv) the second elastic modulus is higher than the elastic modulus of the substrate, and (v) the layer exhibits an increasing elastic modulus gradient through the thickness thereof from the first elastic modulus to the second elastic modulus.

2. The apparatus of claim 1, wherein the elastic modulus gradient of the at least one layer increases monotonically through the thickness thereof from the first elastic modulus to the second elastic modulus.

3. The apparatus of claim 2, wherein the layer is formed from a single layer of material.

4. The apparatus of claim 2, wherein the layer is formed from a plurality of discrete sub-layers of material, one atop the other.

5. The apparatus of claim 4, wherein at least some adjacent layers of the plurality of discrete sub-layers of material have differing elastic moduli.

6. The apparatus of claim 4, wherein each of the plurality of discrete sub-layers of material have differing elastic moduli.

7. The apparatus of claim 1, wherein the elastic modulus gradient of the at least one layer increases discretely through the thickness thereof from the first elastic modulus to the second elastic modulus.

8. The apparatus of claim 1, wherein the first elastic modulus of the layer is one of:

(i) about 1-85% lower than the elastic modulus of the substrate;

(ii) about 5-70% lower than the elastic modulus of the substrate; and

(iii) about 10%-30% lower than the elastic modulus of the substrate.

9. The apparatus of claim 1, wherein the first elastic modulus of the layer is one of:

(i) about 1-60 GPa lower than the elastic modulus of the substrate;

(ii) about 3-50 GPa lower than the elastic modulus of the substrate; and

(iii) about 7-20 GPa lower than the elastic modulus of the substrate.

10. The apparatus of claim 1, wherein the second elastic modulus of the layer is one of:

(i) at least about 25% higher than the elastic modulus of the substrate;

(ii) between about 50-200% higher than the elastic modulus of the substrate;

(iii) about 100% higher than the elastic modulus of the substrate; and

(iv) at least about 200% higher than the elastic modulus of the substrate.

11. The apparatus of claim 1, wherein the second elastic modulus of the layer is one of:

(i) at least about 15-20 GPa higher than the elastic modulus of the substrate;

(ii) between about 20-70 GPa higher than the elastic modulus of the substrate;

(iii) about 70 GPa higher than the elastic modulus of the substrate; and

(iv) at least about 140 GPa higher than the elastic modulus of the substrate.

12. The apparatus of claim 1, wherein a magnitude of the difference between the first and second elastic moduli of the layer is one of:

(i) at least about 25%;

(ii) at least about 50%;

(iii) at least about 100%; and

(iii) at least about 200%.

13. The apparatus of claim 1, wherein a magnitude of the difference between the first and second elastic moduli of the layer is one of:

(i) at least about 15-20 GPa;

(ii) at least about 30-40 GPa;

(iii) at least about 50-60 GPa; and

(iii) at least about 70 GPa.

14. The apparatus of claim 1, wherein the substrate is formed from at least one of quartz, glass, glass-ceramic, oxide glass, ion exchanged glass, and combinations thereof.

15. The apparatus of claim 1, wherein the at least one layer is formed from an inorganic material.

16. The apparatus of claim 1, wherein the at least one layer is formed from at least one of:

Indium-Tin-Oxide (ITO), aluminum doped zinc oxide, gallium doped zinc oxide, fluorine doped tin oxide, Al₂O₃, AlON, TiN, TiC, SiO₂, TiO₂, Nb₂O₅, Ta₂O₅, SiO_XN_Y, SiAl_xO_yN_z, AlO_xN_y, SiN_X, AlN_x, and TiN_X, highly siliceous polymers, highly cured siloxane, highly cured silsesquioxanes, and metal film.

17. The apparatus of claim 1, wherein the thickness of the at least one layer is one of:

(i) between about 50-10,000 nm;

(ii) between about 500-10,000 nm;

(iii) between about 1000-2000 nm;

(iv) between about 10-200 nm;

(v) between about 20-100 nm;

(vi) between about 30-90 nm.

19. A method of making the apparatus of claim 1, by applying the one or more layers onto the substrate.

18. An apparatus, comprising:

a substrate formed from at least one of quartz, glass, glass-ceramic, oxide glass, ion exchanged glass, and combinations thereof, having first and second opposing surfaces, and an elastic modulus of between about 30-100 GPa; and

at least one layer having a thickness between first and second opposing surfaces thereof, where the first surface of the layer contacts the second surface of the substrate thereby forming an interface,

wherein;

(i) the layer exhibits a first elastic modulus proximate to the first surface thereof and a second elastic modulus proximate to the second surface thereof, (ii) the first elastic modulus is at least between about 1-65 GPa lower than the elastic modulus of the substrate, and (iii) the layer exhibits an increasing elastic modulus gradient through the thickness thereof from the first elastic modulus to the second elastic modulus.