LOCALLY HEATED MULTI-ZONE SUBSTRATE SUPPORT

• US 20150043123A1
• Filed: 08/06/2014
• Published: 02/12/2015
• Est. Priority Date: 08/06/2013
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: COX, Michael S.
• Granted Patent: US 9,472,434 B2
• Time in Patent Office: Days
• US Class Current: 361/234
• CPC Class Codes: H01L 21/67103 mainly by conduction
• CPC Class Codes: H01L 21/67248 Temperature monitoring
• CPC Class Codes: H01L 21/6831 using electrostatic chucks
• CPC Class Codes: H01L 21/6833 Details of electrostatic chucks
• CPC Class Codes: Y10T 29/49083 Heater type

Abstract

Embodiments of the present disclosure provide an electrostatic chuck (ESC) having azimuthal temperature control. In one embodiment, the electrostatic chuck includes an insulating base, a dielectric layer disposed on the insulating base, the dielectric layer having a substrate supporting surface, an electrode assembly disposed between the insulating base and the substrate supporting surface, and a plurality of heating elements coupled to the insulating base, the heating elements azimuthally control a temperature profile across a substrate surface.

Claims

1. An electrostatic chuck, comprising:

an insulating base;

a dielectric layer disposed on the insulating base, the dielectric layer having a substrate supporting surface;

an electrode assembly disposed between the insulating base and the substrate supporting surface; and

a plurality of heating elements coupled to the insulating base, the heating elements arranged in independently controllable group of at least one or more heating elements to azimuthally control a temperature profile across a substrate surface.

2. The electrostatic chuck of claim 1, wherein the plurality of heating elements is formed on a top surface the insulating base.

3. The electrostatic chuck of claim 2, wherein the plurality of heating elements is coplanar with the electrode assembly.

4. The electrostatic chuck of claim 1, wherein the plurality of heating elements is formed on a backside surface of the insulating base.

5. The electrostatic chuck of claim 1, wherein the plurality of heating elements are arranged in a grid-like configuration, a pixel-like or dot-like configuration, a polar array configuration, or a concentric configuration.

6. The electrostatic chuck of claim 1, wherein the plurality of heating elements are in the form of discrete metal sections.

7. The electrostatic chuck of claim 1, wherein the plurality of heating elements comprises resistive heating elements or inductive heating elements.

8. The electrostatic chuck of claim 1, wherein the electrode assembly has at least two interleaving electrodes.

9. The electrostatic chuck of claim 8, wherein the at least two interleaving electrodes comprises a first set of electrode fingers and a second set of electrode fingers, wherein the first set of electrode fingers generate charges with a polarity that is different from the second set of electrode fingers.

10. The electrostatic chuck of claim 1, wherein the plurality of heating elements comprises about 40 to about 300 heating elements.

11. The electrostatic chuck of claim 1, wherein the dielectric layer is fabricated from a glass material or a ceramic material selected from a group consisting of silicon carbide, aluminum nitride, aluminum oxide, yttrium containing materials, yttrium oxide (Y₂O₃), yttrium-aluminum-garnet (YAG), titanium oxide (TiO), or titanium nitride (TiN).

12. An electrostatic chuck, comprising:

an insulating base having a first surface and a second surface opposing the first surface;

an electrode assembly formed on the first surface of the insulating base, the electrode assembly having a first electrode interleaved with a second electrode;

a plurality of heating elements formed between interleaved portions of the first and second electrodes; and

an encapsulating member coupled to the electrode assembly.

13. The electrostatic chuck of claim 12, wherein the plurality of heating elements are in the form of discrete sections.

14. The electrostatic chuck of claim 12, wherein the plurality of heating elements comprises resistive heating elements or inductive heating elements.

15. The electrostatic chuck of claim 12, wherein the plurality of heating elements are formed on the first surface the insulating base.

16. The electrostatic chuck of claim 15, wherein the plurality of heating elements are coplanar with the electrode assembly.

17. The electrostatic chuck of claim 12, wherein the plurality of heating elements is formed on the second surface of the insulating base.

18. The electrostatic chuck of claim 12, wherein the encapsulating member is fabricated from a glass material or a ceramic material selected from a group consisting of silicon carbide, aluminum nitride, aluminum oxide, yttrium containing materials, yttrium oxide (Y₂O₃), yttrium-aluminum-garnet (YAG), titanium oxide (TiO), or titanium nitride (TiN).

19. A method for fabricating an electrostatic chuck, comprising:

forming an electrode assembly on an insulating base, wherein the electrode assembly includes a first electrode interleaved with a second electrode;

forming a plurality of heating elements on the insulating base, the heating elements azimuthally control a temperature profile across a substrate surface; and

forming an encapsulating member on the electrode assembly.

20. The method of claim 19, further comprising:

bonding the insulating base to the encapsulating member to form an integral component.