rotational rate sensor having preset quadrature offset

• US 20150052999A1
• Filed: 08/25/2014
• Published: 02/26/2015
• Est. Priority Date: 08/26/2013
• Status: Abandoned Application

• Current Assignee: Robert Bosch GmbH
• Original Assignee: Robert Bosch GmbH
• Inventors: Scheben, Rolf, Gauger, Christoph, Heitz, Markus
• Application Number:
  US14/467,943
• Publication Number:
  US 20150052999A1
• Time in Patent Office: Days
• US Class Current: 73/504.12
• CPC Class Codes: G01C 19/5747 each sensing mass being connected to a driving mass, e.g. driving frames
• CPC Class Codes: G01C 19/5769 Manufacturing; Mounting; Housings
• CPC Class Codes: Y10T 29/49 Method of mechanical manufacture

Abstract

A rotational rate sensor includes a substrate and a seismic mass situated thereon, and configured for detecting a rate of rotation about a rotation axis, the seismic mass having a second mass element coupled to a first mass element, which is drivable to a drive movement along a drive direction perpendicular to the rotation axis, the first and second mass element being deflectable along a detection direction essentially perpendicular to the drive direction and to the rotation axis, the rotational rate sensor having at least one compensating arrangement to produce a compensating force acting on the second mass element, the compensating force being oriented in a compensation direction essentially parallel to the detection direction, the at least one compensating arrangement being the only compensating arrangement and being configured exclusively to produce the compensating force oriented in the compensation direction, the rotational rate sensor being configured such that a quadrature offset force acting on the second mass element is directed exclusively in a preferred direction opposite and parallel to the compensation direction.

Claims

1. A rotational rate sensor for detecting a rotational rate about an axis of rotation, comprising:

a substrate;

a seismic mass situated on the substrate, the seismic mass having a first mass element and a second mass element coupled to the first mass element, the first mass element being capable drivable to a drive movement along a drive direction perpendicular to the axis of rotation, the first mass element and the second mass element being deflectable along a detection direction essentially perpendicular both to the drive direction and to the axis of rotation;

at least one compensating arrangement to produce a compensating force acting on the first mass element and/or the second mass element, the compensating force being oriented in a compensation direction essentially parallel to the detection direction;

wherein the at least one compensating arrangement is the only compensating arrangement, the at least one compensating arrangement being configured exclusively to produce the compensating force oriented in the compensation direction, and/or

wherein the rotational rate sensor is configured such that a quadrature offset force acting on the first mass element and/or the second mass element is directed exclusively in a preferred direction opposite and parallel to the compensation direction.

2. The rotational rate sensor of claim 1, wherein the rotational rate sensor includes a spring system to produce the quadrature offset force directed in the preferred direction.

3. The rotational rate sensor of claim 1, wherein the first mass element is coupled to the second mass element by a spring element of the spring system, the spring element being pre-tensioned to produce the quadrature offset force directed in the preferred direction.

4. The rotational rate sensor of claim 1, wherein the spring system has a plurality of spring elements that couple the first and second mass element, the plurality of spring elements of the spring system having different spring characteristics.

5. The rotational rate sensor of claim 1, wherein the spring structural widths, spring structural heights, and/or spring lengths of at least two spring elements of the plurality of spring elements differ by from 3 to 40 nm.

6. The rotational rate sensor of claim 1, wherein the first mass element and the second mass element are formed at least partly from different functional layers, the functional layers being situated one over the other along a projection direction perpendicular to a main plane of extension of the substrate, the spring element of the spring system having a spring cross-section, so that it is not always the case that one of the main axes of inertia lies parallel to the substrate plane, the spring elements being coupled at a first end to the first mass element, the spring element of the spring system being coupled at a second end to the second mass element.

7. The rotational rate sensor of claim 1, wherein the at least one compensating arrangement is configured for the compensation at least of the quadrature offset force oriented in the preferred direction using the compensating force oriented in the compensation direction, the compensating force and the quadrature offset force essentially canceling one another.

8. The rotational rate sensor of claim 1, wherein the at least one compensating arrangement is a compensating electrode connected to the substrate, the compensating electrode being configured to produce the compensating force as a function of a quadrature voltage applied between the compensating electrode and the second mass element.

11. The rotational rate sensor of claim 1, wherein the spring system has a plurality of spring elements that couple the first and second mass element, the plurality of spring elements of the spring system having different spring characteristics, including a spring structural width, a spring structural height, a spring length, a spring cross-sectional surface extending essentially parallel to the drive direction, a spring type, a spring rigidity sensor, and/or a spring material.

12. The rotational rate sensor of claim 1, wherein the spring structural widths, spring structural heights, and/or spring lengths of at least two spring elements of the plurality of spring elements differ by from 5 to 30 nm.

13. The rotational rate sensor of claim 1, wherein the spring structural widths, spring structural heights, and/or spring lengths of at least two spring elements of the plurality of spring elements differ by from 10 to 20 nm.

9. A production method for producing a rotational rate sensor for detecting a rate of rotation about an axis of rotation of the rotational rate sensor, the method comprising:

providing a substrate in a first production task, a seismic mass being situated on the substrate, a first mass element and a second mass element, coupled to the first mass element, being formed from the seismic mass, wherein the first mass element is situated so as to be drivable to a drive movement along a drive direction perpendicular to the axis of rotation, the first mass element and the second mass element being situated so as to be deflectable along a detection direction essentially perpendicular both to the drive direction and to the axis of rotation, and wherein at least one compensating arrangement is situated on the rotational rate sensor, the at least one compensating arrangement being configured to produce a compensating force acting on the first mass element and/or the second mass element, the compensating force being oriented in a compensation direction essentially parallel to the detection direction;

wherein in a second production task, at least one of the following is satisfied;

(i) as the only compensating arrangement, the at least one compensating arrangement is situated on the rotational rate sensor, the at least one compensating arrangement being configured exclusively for the production of the compensating force oriented in the compensation direction, and (ii) the rotational rate sensor is configured so that a quadrature offset force acting on the first mass element and/or the second mass element is directed exclusively in a preferred direction opposite and parallel to the compensation direction.

10. A quadrature compensation method for a rotational rate sensor, the method comprising:

driving the first mass element to the drive movement along the drive direction;

producing the compensating force on the second mass element, oriented in the compensation direction, through application of a quadrature voltage between the at least one compensating arrangement and the second mass element;

wherein at least one of the following is satisfied;

(i) the compensating force acting on the second mass element exclusively in the compensation direction is produced only by the at least one compensating arrangement, and (ii) a quadrature offset force is produced, the quadrature offset force being directed exclusively in the preferred direction;

wherein the rotational rate sensor for detecting a rotational rate about an axis of rotation, includes;

a substrate;

a seismic mass situated on the substrate, the seismic mass having a first mass element and a second mass element coupled to the first mass element, the first mass element being capable drivable to a drive movement along a drive direction perpendicular to the axis of rotation, the first mass element and the second mass element being deflectable along a detection direction essentially perpendicular both to the drive direction and to the axis of rotation;

at least one compensating arrangement to produce a compensating force acting on the first mass element and/or the second mass element, the compensating force being oriented in a compensation direction essentially parallel to the detection direction;

wherein the at least one compensating arrangement is the only compensating arrangement, the at least one compensating arrangement being configured exclusively to produce the compensating force oriented in the compensation direction, and/or

wherein the rotational rate sensor is configured such that a quadrature offset force acting on the first mass element and/or the second mass element is directed exclusively in a preferred direction opposite and parallel to the compensation direction.