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System, Method and Apparatus for Generating Pressure Pulses in Small Volume Confined Process Reactor

  • US 20150064920A1
  • Filed: 08/28/2013
  • Published: 03/05/2015
  • Est. Priority Date: 08/28/2013
  • Status: Active Grant
First Claim
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1. A plasma processing system comprising:

  • a processing chamber;

    at least one gas source coupled to the processing chamber;

    a controller coupled to the processing chamber and the at least one gas source;

    the processing chamber including;

    a top electrode disposed within a top portion of the processing chamber;

    a substrate support disposed opposite from the top electrode;

    a plasma processing volume having a volume less than a volume of the processing chamber, the plasma processing volume being defined by;

    a surface of the top electrode;

    a supporting surface of a substrate support opposing the surface of the top electrode; and

    an outer perimeter defined by a plasma confinement structure,the plasma confinement structure including at least one outlet port; and

    a conductance control structure movably disposed proximate to the at least one outlet port, wherein the conductance control structure restricts an outlet flow through the at least one outlet port when disposed in a first position to a first flow rate and wherein the conductance control structure increases the outlet flow through the at least one outlet port when disposed in a second position to a second flow rate, wherein the conductance control structure moves between the first position and the second position corresponding to a selected processing state set by the controller during a plasma process.

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