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Molecular Organometallic Resists for EUV

  • US 20150079393A1
  • Filed: 09/13/2013
  • Published: 03/19/2015
  • Est. Priority Date: 09/13/2013
  • Status: Active Grant
First Claim
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1. A photoresist comprising at least one complex (BD2)zM(La)n (Lb)o(Lc)p(Ld)q or (A)yM(Le)n(Lf)o(Lg)p(Lh)q, wherein:

  • M is a metal having a coordination number of Q;

    Q is an integer selected from 2, 3, 4, 5, 6, 7, or 8;

    BD2 is oxalate or carbonate;

    La, Lb, Lc and Ld are ligands, each having a denticity of, respectively, wa, wb, wc and wd;

    z is 1, 2 or 3;

    n, o, p, and q are independently zero, one or two;

    the sum of (n·

    wa) plus (o·

    wb) plus (p·

    wc) plus (q·

    wd) is equal to (Q minus 2z);

    A is selected in each instance from azide and (—

    NO2);

    Le, Lf, Lg and Lh are ligands, each having a denticity of, respectively, we, wf, wg and wh;

    y is any integer up to and including Q; and

    the sum of (n·

    we) plus (o·

    wf) plus (p·

    wg) plus (q·

    wh) is equal to (Q minus y);

    wherein said complex is balanced by a counter ion, if necessary.

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