GYROSCOPE STRUCTURE AND GYROSCOPE WITH IMPROVED QUADRATURE COMPENSATION

• US 20150082885A1
• Filed: 09/10/2014
• Published: 03/26/2015
• Est. Priority Date: 09/11/2013
• Status: Active Grant

• Current Assignee: Murata Manufacturing Co Limited
• Original Assignee: Murata Manufacturing Co Limited
• Inventors: RINKI, Marcus, BLOMQVIST, Anssi, RUOHIO, Jaakko
• Granted Patent: US 9,631,928 B2
• Time in Patent Office: Days
• US Class Current: 73/504.12
• CPC Class Codes: B81B 7/02 containing distinct electrical or optical devices of particular relevance for their function, e.g. microelectro-mechanical systems [MEMS] B81B7/04 takes precedence
• CPC Class Codes: G01C 19/5712 the devices involving a micromechanical structure
• CPC Class Codes: G01C 19/5755 the devices having a single sensing mass
• CPC Class Codes: G01C 19/5776 Signal processing not specific to any of the devices covered by groups G01C19/5607 - G01C19/5719

Abstract

A microelectromechanical gyroscope structure that comprises a seismic mass, a body element, and a spring structure suspending the seismic mass to the body element. In primary oscillation at least part of the seismic mass oscillates in out-of-plane direction. A first conductor is arranged to move with the seismic mass, and a second conductor is attached to the body element. The conductors include adjacent surfaces that extend in the first direction and the third direction. A voltage element is arranged to create between the first surface and the second surface a potential difference and thereby induce an electrostatic force in the second direction and modulated by the primary oscillation of the seismic mass.

Claims

1. A microelectromechanical gyroscope structure, comprising:

a seismic mass;

a body element;

a spring structure suspending the seismic mass to the body element to allow a primary oscillation where at least part of the seismic mass is excited to oscillation in a first direction, and a secondary oscillation where at least part of the seismic mass moves in a second direction that is perpendicular to the first direction, and the seismic mass comprises a surface plane that extends planarly in the second direction and in a third direction, wherein the third direction is perpendicular to the first direction and the second direction;

a first conductor arranged to move with the seismic mass, the first conductor including a first surface that extends on the seismic mass in the first direction and the third direction;

a second conductor attached to the body element and including a second surface extending in the first direction and the third direction, and adjacent to the first surface;

a voltage element arranged to create between the first surface and the second surface a potential difference thereby inducing an electrostatic force in the second direction, which electrostatic force is modulated by the primary oscillation of the seismic mass.

2. The microelectromechanical gyroscope structure of claim 1, wherein

the first surface extends planarly to a first height in the first direction;

the second surface extends planarly to a second height in the first direction;

the first height and the second height are different from each other.

3. The microelectromechanical gyroscope structure of claim 1, wherein the voltage element comprises a direct current bias voltage source connected to the second conductor.

4. The microelectromechanical gyroscope structure of claim 1, wherein

the spring structure is configured to allow a maximum amplitude for the primary oscillation of the seismic mass in the first direction;

the difference between the first height and the second height is equal or more than the maximum amplitude.

5. The microelectromechanical gyroscope structure of claim 1, wherein the second surface is higher than the first surface.

6. The microelectromechanical gyroscope structure of claim 1, wherein the first surface is higher than the second surface.

7. The microelectromechanical gyroscope structure of claim 1, wherein the primary oscillation is rotary oscillation of the seismic mass about an axis that is parallel to the surface plane.

8. The microelectromechanical gyroscope structure of claim 1, wherein the primary oscillation is linear oscillation of the seismic mass away from the body part and towards it.

9. The microelectromechanical gyroscope structure of claim 1, wherein the primary oscillation is buckling oscillation of the seismic mass between two parallel axes.

10. The microelectromechanical gyroscope structure of claim 1, wherein

the surface plane extends rectilinearly in the second direction and in the third direction;

the seismic mass comprises two first side planes that extend planarly in the first direction and in the third direction;

the seismic mass comprises two second side planes that extend planarly in the first direction and in the second direction;

the primary oscillation is rotary oscillation of the seismic mass about a rotation axis that is parallel to the second side planes and that divides the seismic mass into two parts;

the second conductor is adjacent to the first side plane and the distance from the second conductor to the rotation axis is greater than the distance to the first side plane in the same part of the seismic mass.

11. The microelectromechanical gyroscope structure of claim 1, wherein the second conductor comprises at least one elongated beam, a surface of the elongated beam of the second conductor being aligned with the first surface of the first conductor in the seismic mass.

12. The microelectromechanical gyroscope structure of claim 1, wherein the first conductor comprises at least one elongated beam and the second conductor comprises at least one elongated beam, a surface of the elongated beam of the first conductor being aligned with a surface of the elongated beam of the second conductor.

13. The microelectromechanical gyroscope structure of claim 12, wherein the second conductor comprises two elongated beams aligned to each other and attached to a distance from each other to accommodate the elongated beam of the first conductor between them.

14. The microelectromechanical gyroscope structure of claim 12, wherein that

the first conductor and the second conductor comprise a plurality of elongated beams;

elongated beams of the first conductor are aligned to each other to form a first comb structure and elongated beams of the second conductor are aligned to each other to form a second comb structure;

the first comb structure and the second comb structure are coupled to form a periodic pattern of parallel in-plane electrodes.

15. The microelectromechanical gyroscope structure of claim 14, wherein the elongated beams of the first comb structure and the second comb structure extend parallel to the third direction.

16. The microelectromechanical gyroscope structure of claim 14, wherein the elongated beams of the first comb structure and the second comb structure extend parallel to the second direction.

17. The microelectromechanical gyroscope structure of claim 1, wherein the microelectromechanical gyroscope structure comprises

a first seismic mass and a second seismic mass;

the spring structure suspending the seismic masses to the body element and allowing rotary oscillation of the first seismic mass and the second seismic mass about a common primary axis parallel to the second direction;

the spring structure enables also rotary oscillation of the first seismic mass about a first detection axis that is parallel to the first direction;

the second spring assembly enables also rotary oscillation of the second seismic mass about a second detection axis that is parallel to the first direction;

the first detection axis and the second detection axis are separated by a non-zero distance.

18. The microelectromechanical gyroscope structure of claim 17, wherein each of the first seismic mass and the second seismic mass is provided with at least one compensating element formed of a first conductor, a second conductor and a control element.

19. A gyroscope comprising the microelectromechanical gyroscope structure of claim 1.