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PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

  • US 20150087162A1
  • Filed: 05/17/2013
  • Published: 03/26/2015
  • Est. Priority Date: 05/18/2012
  • Status: Active Grant
First Claim
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1. A plasma processing apparatus comprising:

  • a processing container which defines a processing space;

    a microwave generator;

    a dielectric having an opposing surface which faces the processing space;

    a slot plate formed with a plurality of slots and provided on a surface of the dielectric at an opposite side to the opposing surface to radiate microwaves for plasma excitation to the processing space through the dielectric based on the microwaves generated by the microwave generator; and

    a heating member provided within the slot plate.

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