GROWTH OF CUBIC CRYSTALLINE PHASE STRUCURE ON SILICON SUBSTRATES AND DEVICES COMPRISING THE CUBIC CRYSTALLINE PHASE STRUCTURE
First Claim
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1. A semiconductor device comprising:
- a substrate comprising a groove;
a buffer layer formed on a surface of the groove, the buffer layer comprising at least one material chosen from AlN, GaN or AlxGa1-xN, where x is between zero and one;
an epitaxially grown semiconductor material disposed over the buffer layer, at least a portion of the epitaxially grown semiconductor material having a cubic crystalline phase structure.
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Abstract
A semiconductor device is disclosed. The semiconductor device includes a substrate comprising a groove. A buffer layer is formed on a surface of the groove. The buffer layer comprising at least one material chosen from AIN, GaN or AlxGa1-xN, where x is between zero and one. An epitaxially grown semiconductor material is disposed over the buffer layer, at least a portion of the epitaxially grown semiconductor material having a cubic crystalline phase structure. Methods of forming the semiconductor devices are also taught.
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Citations
20 Claims
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1. A semiconductor device comprising:
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a substrate comprising a groove; a buffer layer formed on a surface of the groove, the buffer layer comprising at least one material chosen from AlN, GaN or AlxGa1-xN, where x is between zero and one; an epitaxially grown semiconductor material disposed over the buffer layer, at least a portion of the epitaxially grown semiconductor material having a cubic crystalline phase structure. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 15, 16)
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14. The semiconductor device of 13, wherein the h-GaN region is blocked by an additional structural layer and the c-GaN growth is continued beyond the blocking layer.
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17. A method of forming a semiconductor device, the method comprising:
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providing a planar crystalline substrate comprising a groove exposing different crystal faces than the planar surface; depositing a buffer layer over the substrate, the buffer layer comprising at least one material chosen from AlN, GaN or AlxGa1-xN, where x is between zero and one; epitaxially growing a semiconductor layer over the buffer layer, at least a portion of the epitaxially grown semiconductor layer having a cubic crystalline phase structure. - View Dependent Claims (18, 19, 20)
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Specification