THIN-FILM PHOTOVOLTAIC DEVICE WITH OPTICAL FIELD CONFINEMENT AND METHOD FOR MAKING SAME

• US 20150122324A1
• Filed: 05/17/2013
• Published: 05/07/2015
• Est. Priority Date: 05/18/2012
• Status: Abandoned Application

• Current Assignee: Brookhaven Science Associates, LLC (Government of the United States of America)
• Original Assignee: Brookhaven Science Associates, LLC (Government of the United States of America)
• Inventors: Eisaman, Matthew, Pang, Yutong, Dissanayake, Nanditha
• Application Number:
  US14/399,800
• Publication Number:
  US 20150122324A1
• Time in Patent Office: Days
• US Class Current: 136/256
• CPC Class Codes: H10K 2102/103 comprising indium oxides, e.g. ITO
• CPC Class Codes: H10K 30/353 comprising blocking layers, e.g. exciton blocking layers
• CPC Class Codes: H10K 30/50 Photovoltaic [PV] devices
• CPC Class Codes: H10K 30/80 Constructional details
• CPC Class Codes: H10K 30/82 Transparent electrodes, e.g. indium tin oxide [ITO] electrodes
• CPC Class Codes: H10K 30/821 comprising carbon nanotubes
• CPC Class Codes: H10K 85/1135 Polyethylene dioxythiophene [PEDOT]; Derivatives thereof
• CPC Class Codes: H10K 85/625 containing at least one aromatic ring having 7 or more carbon atoms, e.g. azulene
• CPC Class Codes: H10K 85/655 comprising only sulfur as heteroatom
• CPC Class Codes: Y02E 10/549 Organic PV cells
• CPC Class Codes: Y02P 70/50 Manufacturing or production processes characterised by the final manufactured product

Abstract

A photovoltaic device is provided that includes a first electrode layer and a second electrode layer; and a waveguiding structure disposed between the first electrode layer and the second electrode layer which includes an active layer adapted to convert photons transmitted to the active layer to electrons and holes. The waveguiding structure further includes a first layer adjacent the first electrode layer that includes a hole-conducting material having a first index of refraction, and a second layer including an electron-conducting material having a second index of refraction, wherein the active layer is disposed therebetween. The active layer has an index of refraction that is less than each of the first index of refraction and the second index of refraction and a thickness. The waveguiding structure is characterized by guided modes adapted for optically confining the photons within the active layer.

Claims

1. A photovoltaic device comprising:

a first electrode layer and a second electrode layer; and

a waveguiding structure disposed between the first electrode layer and the second electrode layer and comprising an active layer adapted to convert photons transmitted to the active layer to electrons and holes, the waveguiding structure further comprising a first layer adjacent the first electrode layer, the first layer comprising a hole-conducting material having a first index of refraction, and a second layer comprising an electron-conducting material having a second index of refraction, wherein the active layer is disposed therebetween; and

wherein the active layer has an index of refraction that is less than each of the first index of refraction and the second index of refraction and a thickness, the waveguiding structure being characterized by guided modes and adapted for optically confining the photons within the active layer.

2. The photovoltaic device of claim 1, further comprising a coupling structure disposed between the first electrode layer and the second electrode layer and adapted to couple incident photons into the guided modes of the waveguiding structure.

3. The photovoltaic device of claim 2, wherein the coupling structure is disposed between one of the first and second electrode layer and the waveguiding structure.

4. The photovoltaic device of claim 2, wherein the coupling structure is disposed between the active layer and one of the first layer and the second layer.

5. The photovoltaic device of claim 2, wherein the coupling structure is formed from at least one of the active layer, the first layer, and the second layer.

6. The photovoltaic device of claim 2, wherein the coupling structure comprises a nanostructured metal.

7. The photovoltaic device of claim 6, wherein the nanostructured metal includes at least one of Al, Ag and Au.

8. The photovoltaic device of claim 2, wherein the coupling structure is periodic.

9. The photovoltaic device of claim 2, wherein the coupling structure is formed by nanotexturing to produce a random structure.

10. The photovoltaic device of claim 1, further comprising a transparent substrate, wherein the first electrode layer is disposed on the transparent substrate, the photovoltaic device being adapted for solar radiation incidence on the substrate, and wherein the substrate, first electrode and first layer are substantially transparent over a AM1.5G solar spectrum.

11. The photovoltaic device of claim 10, further comprising a coupling structure disposed between the first electrode layer and the substrate and adapted to couple incident photons into the guided modes of the waveguiding structure.

12. The photovoltaic device of claim 1, wherein the hole-conducting material of the first layer comprises at least one of vanadium pentoxide (V₂O₅), molybdenum oxide (MoO₃), tungsten(VI) oxide (WO₃), manganese oxide (MnO₂), copper oxide (CuO) and nickel(II) oxide (NiO).

13. The photovoltaic device of claim 1, wherein the electron-conducting material of the second layer comprises at least one of titanium(IV) oxide (TiO₂) and zinc oxide (ZnO).

14. The photovoltaic device of claim 1, wherein the hole-conducting material of the first layer comprises at least one of vanadium pentoxide (V₂O₅), molybdenum oxide (MoO₃), and tungsten(VI) oxide (WO₃), and the electron-conducting material of the second layer comprises at least one of titanium(IV) oxide (TiO₂) and Zinc oxide (ZnO).

15. The photovoltaic device of claim 14, wherein the active layer comprises P3HT:

PCBM.

16. The photovoltaic device of claim 1, wherein the active layer comprises an organic polymer.

17. The photovoltaic device of claim 16, wherein the active layer comprises at least one of poly(3-hexyl thiophene):

[6,6]-phenyl C₆₁-butyric acid methyl ester (P3HT;

PCBM), poly[2,6-(4,4-bis-(2-ethylhexyl)-4H-cyclopenta[2,1-b;

3,4-b′

]dithiophene)-alt-4,7-(2,1,3-benzothiadiazole)];

phenyl-C₆₁-butyric acid methyl ester (PCPDTBT;

PCBM) and poly[N-9′

-heptadecanyl-2,7-carbazole-alt-5,5-(4′

,7′

-di-2-thienyl-2′

,1′

,3′

-benzothiadiazole)];

phenyl-C₆₁-butyric acid methyl ester (PCDTBT;

PCBM).

18. The photovoltaic device of claim 1, wherein the active layer comprises small molecules.

19. The photovoltaic device of claim 18, wherein the active layer comprises at least one of squaraine, subphalocyanines and acenes.

20. The photovoltaic device of claim 1, wherein the active layer comprises one of a pyrite based absorber and a carbon nanotube based absorber.

21. The photovoltaic device of claim 1, wherein the index of refraction of the active layer is between about 1.0 and about 2.0, wherein each of the first index of refraction and the second index of refraction is greater than about 2.0, and wherein a differential index of refraction at each interface between the active layer and each of the first and the second layer is sufficient to optically confine the photons within the active layer.

22. The photovoltaic device of claim 1, wherein the first electrode comprises at least one of ITO, FTO, Sn2O, graphene, carbon nanotube film, and metal nanowire film.

23. The photovoltaic device of claim 22, wherein the second electrode comprises at least one of Al, Ag, Au and graphene.

24. The photovoltaic device of claim 1, wherein the second electrode comprises at least one of ITO, FTO, Sn2O, graphene, carbon nanotube film, and metal nanowire film, and the first electrode comprises at least one of Al, Ag and graphene, wherein the photovoltaic device is adapted for extraction of holes from the first electrode and extraction of electrons from the second electrode.

25. The photovoltaic device of claim 1, wherein each of the first layer and the second layer has a thickness between about 10 nm and 60 nm.

26. The photovoltaic device of claim 1, wherein the thickness of the active layer is less than about 100 nm.

27. The photovoltaic device of claim 1, wherein the thickness of the active layer is between about 10 nm and about 60 nm.

28. The photovoltaic device of claim 1, wherein the active layer is characterized by an absorption spectrum, and wherein at least one of the first layer and the second layer is characterized by a different absorption spectrum, the at least one of the first layer and the second layer being adapted to convert incident photons to electrons and holes according to the different absorption spectrum.

29. The photovoltaic device of claim 28, wherein the at least one of the first layer and the second layer comprises one of nanocrystalline Si and amorphous Si.

30. The photovoltaic device of claim 28, wherein the at least one of the first layer and the second layer comprises one of PbSe and PbS nanocrystals.

31. The photovoltaic device of claim 1, wherein the hole-conducting material of the first layer is characterized by a hole conductivity above 10-3 S/cm, and the electron-conducting material of the second layer is characterized by an electron conductivity above 10-3 S/cm.

32. The photovoltaic device of claim 31, wherein the first layer is characterized by an index of refraction greater than 2.0 and a transmission of at least 90% over an AM1.5G solar spectrum.

33. The photovoltaic device of claim 31, wherein the second layer is characterized by an index of refraction greater than 2.0 and a transmission of at least 90% over an AM1.5G solar spectrum.

40. A power conversion apparatus comprising the photovoltaic device of claim 1.

34. A photovoltaic device comprising:

a first electrode layer;

a waveguiding structure comprising a first layer adjacent the first electrode layer and comprising a hole-conducting material having a high index of refraction, a semi-transparent second electrode layer comprising a metal and adapted for incident radiation being transmitted therethrough, and an active layer adapted to convert photons transmitted to the active layer to electrons and holes disposed between the semi-transparent second electrode layer and the first layer,

wherein the active layer has an index of refraction that is less than the high index of refraction of the first layer and less than an index of refraction of the semi-transparent second electrode layer, the waveguiding structure being characterized by guided modes and adapted for optically confining the photons within the active layer; and

a coupling structure disposed between the first electrode layer and the semi-transparent second electrode layer, the coupling structure coupling photons incident on and transmitted through the semi-transparent second electrode layer of the photovoltaic device into the guided modes of the waveguiding structure.

35. The photovoltaic device of claim 34, wherein the second electrode layer comprises one of gold, silver, and aluminum.

36. The photovoltaic device of claim 35, wherein the second electrode layer has a thickness of about 10 nm to about 30 nm, and wherein the active layer has a thickness between about 5 nm and about 60 nm.

37. The photovoltaic device of claim 35, wherein the active layer comprises one of P3HT:

PCBM, PCPDTBT;

PCBM and PCDTBT;

PCBM.

38. The photovoltaic device of claim 35, wherein the hole-conducting material comprises at least one of vanadium pentoxide (V2O5), molybdenum oxide (MoO3), tungsten(VI) oxide (WO3), manganese oxide (MnO2), copper oxide (CuO) and nickel (II) oxide (NiO).

39. The photovoltaic device of claim 35, wherein the second electrode is a transparent conductive oxide, and wherein the photovoltaic device is adapted to be semi-transparent over an AM1.5G solar spectrum.