SHOWERHEAD AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME
First Claim
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1. A showerhead, comprising:
- a body configured to receive a reaction gas;
a nozzle on the body configured to inject the reaction gas to a substrate; and
a plurality of conducting members in thermal contact with the body to conduct heat generated from the substrate.
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Abstract
A showerhead includes a body configured to receive a reaction gas, a nozzle on the body configured to inject the reaction gas to a substrate, and a plurality of conducting members in thermal contact with the body to conduct heat generated from the substrate.
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Citations
20 Claims
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1. A showerhead, comprising:
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a body configured to receive a reaction gas; a nozzle on the body configured to inject the reaction gas to a substrate; and a plurality of conducting members in thermal contact with the body to conduct heat generated from the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. An apparatus for processing a substrate, the apparatus comprising:
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a reaction chamber configured to receive the substrate; a heater positioned on a bottom surface of the reaction chamber to heat the substrate; and a showerhead including; a body configured to receive a reaction gas, a nozzle on the body configured to inject the reaction gas to the substrate, and a plurality of conducting members in thermal contact with the body to conduct heat generated from the substrate. - View Dependent Claims (14, 15)
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16. A showerhead, comprising:
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a body configured to receive a reaction gas; a nozzle on the body configured to inject the reaction gas to a substrate; and a plurality of conducting members in thermal contact with the body to conduct heat generated from the substrate, the plurality of conducting members defining upper and lower surfaces of the showerhead. - View Dependent Claims (17, 18, 19, 20)
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Specification