POLISHING PAD AND METHOD FOR MANUFACTURING SAME
First Claim
1. A method of manufacturing a polishing pad, whereby materials for forming a polishing layer are mixed and solidified by a chemical reaction so as to manufacture the polishing pad, the method comprising:
- (a) grinding organic materials by using a physical method so as to form micro-organic particles;
(b) mixing the micro-organic particles formed in (a) with the materials for forming the polishing layer;
(c) mixing at least one selected from the group consisting of inert gas, a capsule type foaming agent, and a chemical foaming agent that are capable of controlling sizes of pores, with the mixture in (b) so as to form gaseous pores;
(d) performing gelling and hardening of the mixture generated in (c) so as to form a polishing layer; and
(e) processing the polishing layer so as to distribute open pores defined by opening gaseous pores on a surface of the polishing layer.
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Accused Products
Abstract
Polishing pad and method of manufacturing the same, the method, whereby materials for forming a polishing layer are mixed and solidified by a chemical reaction so as to manufacture the polishing pad, the method including: grinding organic materials by using a physical method so as to form micro-organic particles; mixing the micro-organic particles formed in the operation with the materials for forming the polishing layer; mixing at least one selected from the group consisting of inert gas, a capsule type foaming agent, and a chemical foaming agent that are capable of controlling sizes of pores, with the mixture in the operation so as to form gaseous pores; performing gelling and hardening of the mixture generated in the operation so as to form a polishing layer; and processing the polishing layer so as to distribute open pores defined by opening gaseous pores on a surface of the polishing layer.
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Citations
14 Claims
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1. A method of manufacturing a polishing pad, whereby materials for forming a polishing layer are mixed and solidified by a chemical reaction so as to manufacture the polishing pad, the method comprising:
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(a) grinding organic materials by using a physical method so as to form micro-organic particles; (b) mixing the micro-organic particles formed in (a) with the materials for forming the polishing layer; (c) mixing at least one selected from the group consisting of inert gas, a capsule type foaming agent, and a chemical foaming agent that are capable of controlling sizes of pores, with the mixture in (b) so as to form gaseous pores; (d) performing gelling and hardening of the mixture generated in (c) so as to form a polishing layer; and (e) processing the polishing layer so as to distribute open pores defined by opening gaseous pores on a surface of the polishing layer. - View Dependent Claims (3, 4, 5)
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2. A method of manufacturing a polishing pad, whereby materials for forming a polishing layer are mixed and solidified by a chemical reaction so as to manufacture the polishing pad, the method comprising:
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(a) including monomers for forming micro-organic particles in the materials for forming a polishing layer and forming and dispersing the micro-organic particles by polymerization of the monomers after stirring is performed; (b) mixing at least one selected from the group consisting of inert gas, a capsule type foaming agent, and a chemical foaming agent that are capable of controlling sizes of pores, with the mixture in (a) so as to form gaseous pores; (c) performing gelling and hardening of the mixture generated in (b) so as to form a polishing layer; and (d) processing the polishing layer so as to distribute open pores defined by opening gaseous pores on a surface of the polishing layer. - View Dependent Claims (10, 11, 12)
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6. A polishing pad that performs a polishing process by moving in contact with a surface of an object to be polished, the polishing pad comprising a polishing layer,
wherein the polishing layer comprises at least one of micro-organic particles formed by physically grinding organic materials and micro-organic particles formed by chemical polymerization of monomers and gaseous pores formed by at least one selected from the group consisting of inert gas, a capsule type foaming agent, and a chemical agent, and open pores that are defined by opening the gaseous pores are distributed on a surface of the polishing layer.
Specification