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POLISHING PAD AND METHOD FOR MANUFACTURING SAME

  • US 20150133039A1
  • Filed: 02/12/2013
  • Published: 05/14/2015
  • Est. Priority Date: 05/23/2012
  • Status: Abandoned Application
First Claim
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1. A method of manufacturing a polishing pad, whereby materials for forming a polishing layer are mixed and solidified by a chemical reaction so as to manufacture the polishing pad, the method comprising:

  • (a) grinding organic materials by using a physical method so as to form micro-organic particles;

    (b) mixing the micro-organic particles formed in (a) with the materials for forming the polishing layer;

    (c) mixing at least one selected from the group consisting of inert gas, a capsule type foaming agent, and a chemical foaming agent that are capable of controlling sizes of pores, with the mixture in (b) so as to form gaseous pores;

    (d) performing gelling and hardening of the mixture generated in (c) so as to form a polishing layer; and

    (e) processing the polishing layer so as to distribute open pores defined by opening gaseous pores on a surface of the polishing layer.

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