PLASMA PROCESSING APPARATUS AND MICROWAVE INTRODUCTION DEVICE
First Claim
1. A plasma processing apparatus comprising:
- a process chamber for accommodating an object to be processed, a plane shape of the object being circular;
a mounting table placed within the process chamber, the mounting table having a mounting surface for mounting the object thereon;
a gas supply mechanism for supplying a process gas into the process chamber; and
a microwave introduction device for introducing a microwave into the process chamber to produce a plasma of the process gas in the process chamber,wherein the microwave introduction device includes a conductive member, which is disposed above the process chamber and has a plurality of openings, and a plurality of microwave transmitting windows which is fitted into the respective openings and transmits and introduces the microwave into the process chamber,wherein the microwave transmitting windows are arranged on one virtual plane parallel to or substantially parallel to the mounting surface, the microwave transmitting windows including a first, a second and a third microwave transmitting window, the first to the third microwave transmitting window being disposed adjacent to each other, andwherein the first to the third microwave transmitting window are arranged such that a distances between center points of the first to the third microwave transmitting window are equal to or substantially equal to each other, and the center points of the first to the third microwave transmitting window are arranged with an equal or approximately equal interval on a circumference of a concentric circle to the plane shape of the object.
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Accused Products
Abstract
A plasma processing apparatus includes a microwave introduction device which introduces a microwave into a process chamber. The microwave introduction device includes a plurality of microwave transmitting plates which is fitted into a plurality of openings of a ceiling. The microwave transmitting plates are arranged on one virtual plane parallel to a mounting surface of a mounting table, with the microwave transmitting plates fitted into the respective openings. The microwave transmitting plates includes first to third microwave transmitting plates. The first to third microwave transmitting plates are arranged in such a manner that a distance between the center point of the first microwave transmitting window and the center point of the second microwave transmitting window becomes equal or approximately equal to a distance between the center point of the first microwave transmitting window and the center point of the third microwave transmitting window.
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Citations
8 Claims
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1. A plasma processing apparatus comprising:
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a process chamber for accommodating an object to be processed, a plane shape of the object being circular; a mounting table placed within the process chamber, the mounting table having a mounting surface for mounting the object thereon; a gas supply mechanism for supplying a process gas into the process chamber; and a microwave introduction device for introducing a microwave into the process chamber to produce a plasma of the process gas in the process chamber, wherein the microwave introduction device includes a conductive member, which is disposed above the process chamber and has a plurality of openings, and a plurality of microwave transmitting windows which is fitted into the respective openings and transmits and introduces the microwave into the process chamber, wherein the microwave transmitting windows are arranged on one virtual plane parallel to or substantially parallel to the mounting surface, the microwave transmitting windows including a first, a second and a third microwave transmitting window, the first to the third microwave transmitting window being disposed adjacent to each other, and wherein the first to the third microwave transmitting window are arranged such that a distances between center points of the first to the third microwave transmitting window are equal to or substantially equal to each other, and the center points of the first to the third microwave transmitting window are arranged with an equal or approximately equal interval on a circumference of a concentric circle to the plane shape of the object. - View Dependent Claims (2, 3, 4)
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5. A microwave introduction device for introducing a microwave into a process chamber for accommodating an object to produce a plasma of a process gas in the process chamber, a plane shape of the object being circular, comprising:
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a conductive member which is disposed above the process chamber and has a plurality of openings; and a plurality of microwave transmitting windows which is fitted into the respective openings and transmits and introduces the microwave into the process chamber, wherein the microwave transmitting windows are arranged on one virtual plane, the microwave transmitting windows including a first, a second and a third microwave transmitting window, the first to the third microwave transmitting window being disposed adjacent to each other, and wherein the first to the third microwave transmitting window are arranged such that distances between center points of the first to the third microwave transmitting window are equal to or substantially equal to each other, and the center points of the first to the third microwave transmitting window are arranged with an equal or approximately equal interval on a circumference of a concentric circle to the plane shape of the object. - View Dependent Claims (6, 7, 8)
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Specification