METHOD OF MAKING A STACK OF THE TYPE COMPRISING A FIRST ELECTRODE, AN ACTIVE LAYER, AND A SECOND ELECTRODE

• US 20150144899A1
• Filed: 06/03/2013
• Published: 05/28/2015
• Est. Priority Date: 06/05/2012
• Status: Active Grant

• Current Assignee: Commissariat a L'Energie Atomique (French Alternative Energies and Atomic Energy Commission), ISORG SA
• Original Assignee: French Alternative Energies and Atomic Energy Commission
• Inventors: Verilhac, Jean-Marie, Charlot, Simon
• Granted Patent: US 9,735,361 B2
• Time in Patent Office: Days
• US Class Current: 257/40
• CPC Class Codes: H10K 10/26 Diodes comprising organic-organic junctions
• CPC Class Codes: H10K 10/82 Electrodes
• CPC Class Codes: H10K 2102/341 Short-circuit prevention
• CPC Class Codes: H10K 30/20 comprising organic-organic junctions, e.g. donor-acceptor junctions
• CPC Class Codes: H10K 30/50 Photovoltaic [PV] devices
• CPC Class Codes: H10K 30/81 Electrodes
• CPC Class Codes: H10K 30/82 Transparent electrodes, e.g. indium tin oxide [ITO] electrodes
• CPC Class Codes: H10K 30/821 comprising carbon nanotubes
• CPC Class Codes: H10K 71/10 Deposition of organic active material
• CPC Class Codes: H10K 71/233 by photolithographic etching
• CPC Class Codes: H10K 71/40 Thermal treatment, e.g. annealing in the presence of a solvent vapour
• CPC Class Codes: H10K 71/621 Providing a shape to conductive layers, e.g. patterning or selective deposition
• CPC Class Codes: H10K 71/861 Repairing
• CPC Class Codes: Y02E 10/549 Organic PV cells

Abstract

A method of making a stack of the type comprising a first electrode, an active layer, and a second electrode, for use in an electronic device, in particular of the organic photodetector type or the organic solar cell type, the method comprising the following steps:

• • a) depositing a first layer (2) of conductive material on a substrate (1) in order to form the first electrode;
  • b) depositing an active layer (3) in the form of a thin organic semiconductor layer, this layer including non-continuous zones (30);
  • c) locally eliminating the first conductive layer (2) through the non-continuous zones (30) of the active layer by chemical attack; and
  • d) depositing a second layer (4) of conductive material on the active layer (3) in order to form the second conductive electrode.

Claims

1. A method of making a stack of the type comprising a first electrode, an active layer, and a second electrode, for use in an electronic device, in particular of the organic photodetector type or the organic solar cell type, the method comprising the following steps:

a) depositing a first layer (2) of conductive material on a substrate (1) in order to form the first electrode;

b) depositing an active layer (3) in the form of a thin organic semiconductor layer, this layer including non-continuous zones (30);

c) locally eliminating the first conductive layer (2) through the non-continuous zones (30) of the active layer (3) by chemical attack; and

d) depositing a second layer (4) of conductive material on the active layer (3) in order to form the second conductive electrode.

2. A method according to claim 1, wherein the first layer (2) is made of at least one material selected from a transparent conductive oxide, a metal, and a carbon-containing material.

3. A method according to claim 2, wherein the metal material is in the form of a continuous layer or of an array of metal nanowires.

4. A method according to claim 1, wherein step c) is performed by means of an etching solution or by means of a solvent.

5. A method according to claim 4, wherein the etching solution or the solvent is applied to the entire active layer (3).

6. A method according to claim 4, wherein the etching solution or the solvent is applied to the active layer (3) locally.

7. A method according to claim 1, wherein the active layer is deposited in the form of a continuous layer or in localized manner.

8. A method according to claim 1, wherein an interface layer is deposited between the first layer (2) of conductive material and the active layer (3), and/or between the active layer (3) and the second layer (4) of conductive material.

9. A method according to claim 1, wherein a layer of dielectric material is deposited between the first layer of conductive material (2) and the active layer (3), or on the active layer.

10. A stack of the type comprising a first electrode, an active layer, and a second electrode, for use in an electronic device and comprising in succession:

a first layer (2) of conductive material forming the first electrode and including zones (20) having no material;

an active layer (3) in the form of a thin organic semiconductor layer, this layer including non-continuous zones (30); and

a second layer (4) of conductive material, forming the second conductive electrode.