ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
First Claim
1. An illumination system having a pupil plane, the illumination system comprising:
- an optical integrator configured so that, during use of the illumination system, the optical integrator produces a plurality of secondary light sources in the pupil plane, the optical integrator comprising a plurality of light entrance facets, each light entrance facet being associated with a secondary light source;
a spatial light modulator having a light exit surface, the spatial light modulator configured so that, during use of the illumination system, the spatial light modulator transmits or reflects impinging projection light in a spatially resolved manner;
a pupil forming unit configured so that, during use of the illumination system, the pupil forming unit directs projection light onto the spatial light modulator;
an objective configured so that, during use of the illumination system, the objective images the light exit surface of the spatial light modulator onto the light entrance facets of the optical integrator; and
a control unit configured so that, during use of the illumination system, the control unit controls the pupil forming unit and the spatial light modulator,wherein;
the light exit surface of the optical light modulator comprises groups of object areas which are separated by areas that are not imaged on the light entrance facets during use of the illumination system;
the objective is configured so that, during use of the illumination system, the objective combines images of the object areas so that the images of the object areas abut on the optical integrator; and
the illumination system is a microlithographic illumination system.
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Accused Products
Abstract
An illumination system of a microlithographic projection exposure apparatus includes an optical integrator having a plurality of light entrance facets each being associated with a secondary light source. A spatial light modulator has a light exit surface and transmit or to reflect impinging projection light in a spatially resolved manner. A pupil forming unit directs projection light on the spatial light modulator. An objective images the light exit surface of the spatial light modulator onto the light entrance facets of the optical integrator. The light exit surface of the optical light modulator includes groups of object areas being separated by areas that are not imaged on the light entrance facets. The objective combines images of the object areas so that the images of the object areas abut on the optical integrator.
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Citations
23 Claims
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1. An illumination system having a pupil plane, the illumination system comprising:
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an optical integrator configured so that, during use of the illumination system, the optical integrator produces a plurality of secondary light sources in the pupil plane, the optical integrator comprising a plurality of light entrance facets, each light entrance facet being associated with a secondary light source; a spatial light modulator having a light exit surface, the spatial light modulator configured so that, during use of the illumination system, the spatial light modulator transmits or reflects impinging projection light in a spatially resolved manner; a pupil forming unit configured so that, during use of the illumination system, the pupil forming unit directs projection light onto the spatial light modulator; an objective configured so that, during use of the illumination system, the objective images the light exit surface of the spatial light modulator onto the light entrance facets of the optical integrator; and a control unit configured so that, during use of the illumination system, the control unit controls the pupil forming unit and the spatial light modulator, wherein; the light exit surface of the optical light modulator comprises groups of object areas which are separated by areas that are not imaged on the light entrance facets during use of the illumination system; the objective is configured so that, during use of the illumination system, the objective combines images of the object areas so that the images of the object areas abut on the optical integrator; and the illumination system is a microlithographic illumination system. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
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22. A method of operating an illumination system of a microlithographic projection exposure apparatus comprising a spatial light modulator having a light exit surface comprising first areas separated by second areas, comprising the following steps:
imaging the first areas, but not the second areas, on a final image plane so that images of the first areas abut in the final image plane.
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23. An optical system having a final image plane, the optical system comprising:
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a spatial light modulator having a light exit surface, the spatial light modulator configured so that, during use of the optical system, the spatial light modulator modulates an optical property of light in a spatially resolved manner, the light exit surface comprising first and second areas, the second areas being separate the first areas, the second areas not being imaged on the final image plane during use of the optical system; an objective configured so that, during use of the optical system, the objective images the light exit surface of the spatial light modulator onto the final image plane, wherein the objective is configured so that, during use of the optical system, the objective combines images of the first areas so that these images abut in the final image plane.
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Specification