MULTI-BEAM SYSTEM FOR HIGH THROUGHPUT EBI
First Claim
1. A scanning charged particle beam device configured to image a specimen, comprising:
- a source of charged particles,a condenser lens for influencing the charged particles;
an aperture plate having at least two aperture openings to generate at least two primary beamlets of charged particles,at least two deflectors configured to individually deflect the at least two primary beamlets of charged particles so that each primary beamlet appears to come from a different source, wherein the at least two deflectors are multi-pole deflectors with an order of poles of 8 or higher;
a multi-pole deflector with an order of poles of 8 or higher;
an objective lens configured to focus the at least two primary beamlets onto the specimen, wherein the objective lens is a retarding field compound lens;
a beam separator configured to separate the at least two primary beamlets from at least two signal beamlets;
a beam bender, a deflector or mirror configured to deflect the at least two signal beamlets, wherein the beam bender is selected from the group consisting of;
a hemispherical beam bender and a beam bender having at least two curved electrodes; and
at least two detector elements configured to individually measure the at least two signal beamlets.
1 Assignment
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Accused Products
Abstract
A scanning charged particle beam device configured to image a specimen is described. The scanning charged particle beam device includes a source of charged particles, a condenser lens for influencing the charged particles, an aperture plate having at least two aperture openings to generate at least two primary beamlets of charged particles, at least two deflectors, wherein the at least two deflectors are multi-pole deflectors, a multi-pole deflector with an order of poles of 8 or higher, an objective lens, wherein the objective lens is a retarding field compound lens, a beam separator configured to separate the at least two primary beamlets from at least two signal beamlets, a beam bender, or a deflector or a mirror configured to deflect the at least two signal beamlets, wherein the beam bender is a hemispherical beam bender or beam bender having at least two curved electrodes, and at least two detector elements.
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Citations
20 Claims
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1. A scanning charged particle beam device configured to image a specimen, comprising:
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a source of charged particles, a condenser lens for influencing the charged particles; an aperture plate having at least two aperture openings to generate at least two primary beamlets of charged particles, at least two deflectors configured to individually deflect the at least two primary beamlets of charged particles so that each primary beamlet appears to come from a different source, wherein the at least two deflectors are multi-pole deflectors with an order of poles of 8 or higher; a multi-pole deflector with an order of poles of 8 or higher; an objective lens configured to focus the at least two primary beamlets onto the specimen, wherein the objective lens is a retarding field compound lens; a beam separator configured to separate the at least two primary beamlets from at least two signal beamlets; a beam bender, a deflector or mirror configured to deflect the at least two signal beamlets, wherein the beam bender is selected from the group consisting of;
a hemispherical beam bender and a beam bender having at least two curved electrodes; andat least two detector elements configured to individually measure the at least two signal beamlets. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. An arrayed scanning charged particle beam device, comprising:
at least two scanning charged particle beam devices configured to image a specimen, each scanning charged particle beam device comprises; a source of charged particles, a condenser lens for influencing the charged particles; an aperture plate having at least two aperture openings to generate at least two primary beamlets of charged particles, at least two deflectors configured to individually deflect the at least two primary beamlets of charged particles so that each primary beamlet appears to come from a different source, wherein the at least two deflectors are multi-pole deflectors with an order of poles of 8 or higher; a multi-pole deflector with an order of poles of 8 or higher; an objective lens configured to focus the at least two primary beamlets onto the specimen, wherein the objective lens is a retarding field compound lens; a beam separator configured to separate the at least two primary beamlets from at least two signal beamlets; a beam bender, a deflector or mirror configured to deflect the at least two signal beamlets, wherein the beam bender is selected from the group consisting of;
a hemispherical beam bender and a beam bender having at least two curved electrodes; andat least two detector elements configured to individually measure the at least two signal beamlets.
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19. A arrayed scanning charged particle beam device configured to image a specimen, comprising:
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at least five scanning charged particle beam devices configured to image a specimen, each scanning charged particle beam device comprises; a source of charged particles, a condenser lens for influencing the charged particles; an aperture plate having at least five aperture openings to generate at least five primary beamlets of charged particles, wherein the smallest distance of any two aperture openings of the at least two aperture openings is 70 μ
m or higher,at least five deflectors configured to individually deflect the at least five primary beamlets of charged particles so that each primary beamlet appears to come from a different source, wherein the at least two deflectors are multi-pole deflectors with an order of poles of 8 or higher; a scanning deflector system for scanning the at least five primary beams of charged particles over the specimen, wherein the scanning deflector system includes at least one scanning deflector, and wherein the at least one scanning deflector is a multi-pole deflector with an order of poles of 8 or higher an objective lens configured to focus the at least five primary beamlets onto the specimen, wherein the objective lens is a retarding field compound lens; a beam separator configured to separate the at least five primary beamlets from at least five signal beamlets; a beam bender, a deflector or mirror configured to deflect the at least five signal beamlets, wherein the beam bender is selected from the group consisting of;
a hemispherical beam bender and a beam bender having at least two curved electrodes; andat least five detector elements configured to individually measure the at least five signal beamlets. - View Dependent Claims (20)
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Specification