LITHOGRAPHIC APPARATUS

• US 20150160569A1
• Filed: 05/08/2013
• Published: 06/11/2015
• Est. Priority Date: 05/21/2012
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Osorio Oliveros, Edgar Alberto
• Granted Patent: US 9,599,912 B2
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: G02B 27/0006 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation G02B1/18 takes precedence; cleaning in general B08B
• CPC Class Codes: G02B 5/085 at least one of the reflecting layers comprising metal
• CPC Class Codes: G02B 5/0891 Ultraviolet [UV] mirrors apparatus for microlithography exposure G03F7/70; X-ray multilayer structures G21K1/06
• CPC Class Codes: G03F 1/24 Reflection masks; Preparation thereof
• CPC Class Codes: G03F 1/62 Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
• CPC Class Codes: G03F 7/7015 Details of optical elements
• CPC Class Codes: G03F 7/70916 Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
• CPC Class Codes: G03F 7/70958 Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
• CPC Class Codes: G21K 1/062 Devices having a multilayer structure
• CPC Class Codes: G21K 2201/067 Construction details
• CPC Class Codes: Y10S 977/734 Fullerenes, i.e. graphene-based structures, such as nanohorns, nanococoons, nanoscrolls or fullerene-like structures, e.g. WS2 or MoS2 chalcogenide nanotubes, planar C3N4, etc.

Abstract

A reflector includes a reflecting surface or structure provided with a cap layer formed from Silicene or a Silicene derivative. The reflector may be provided in a lithographic apparatus.

Claims

1. A reflector comprising a reflecting surface or structure provided with a layer, the layer comprising a substance selected from Silicene, or a Silicene derivative, or combinations thereof.

2. The reflector according to claim 1, wherein the layer is a single layer.

3. The reflector according to claim 1, wherein the layer comprises multiple layers, and wherein at least one layer from the multiple layers comprises a substance selected from Silicene, or a Silicene derivative, or combinations thereof.

4. The reflector according to claim 1, wherein the layer is a cap layer.

5. The reflector according to claim 1, wherein the reflector is a multilayer mirror comprising alternating layers of a first material and a second material, and wherein a layer comprising a substance selected from Silicene, or a Silicene derivative, or combinations thereof, is provided between at least two of the alternating layers.

7. The reflector according to claim 1, wherein the reflecting structure is a multilayer stack.

8. The reflector according to claim 1, wherein the reflecting surface is metal.

6. A reflector comprising a reflecting surface or structure comprising a substance selected from Silicene, or a Silicene derivative, or combinations thereof.

9. A method of applying a cap layer to a reflector comprising

forming a layer comprising a substance selected from Silicene, or a Silicene derivative, or combinations thereof, on a material,

pressing the layer onto a surface of the reflector,

then etching away the material such that a cap layer comprising a substance selected from Silicene, or a Silicene derivative, or combinations thereof, is formed on the reflector.

10. (canceled)

11. A pellicle for a lithographic mask comprising a substance selected from Silicene, or a Silicene derivative, or fullerene, or a fullerene derivative, or combinations thereof.

12. The pellicle according to claim 11, wherein the pellicle comprises a plurality of layers or flakes.

13. The pellicle according to claim 11, further comprising one or more layers of supporting material or a supporting structure which supports one or more layers of the pellicle.

14. (canceled)

15. A lithographic mask comprising a patterned reflective surface or structure provided with a layer or a pellicle comprising a substance selected from Silicene, or a Silicene derivative, or fullerene, or a fullerene derivative, or combinations thereof.

16. (canceled)

17. (canceled)

18. A membrane for debris mitigation comprising a substance selected from Silicene, or a Silicene derivative, or fullerene, or a fullerene derivative, or combinations thereof, held by a supporting structure.

19-26. -26. (canceled)

27. An apparatus comprising one or more of:

a reflector comprising a reflecting surface or structure provided with a layer, the layer comprising a substance selected from Silicene, or a Silicene derivative, or combinations thereof, or

a pellicle for a lithographic mask comprising a substance selected from Silicene, or a Silicene derivative, or fullerene, or a fullerene derivative, or combinations thereof, or

a support to hold a lithographic mask comprising a patterned reflective surface or structure provided with a layer or a pellicle comprising a substance selected from Silicene, or a Silicene derivative, or fullerene, or a fullerene derivative, or combinations thereof, or

a membrane for debris mitigation comprising a substance selected from Silicene, or a Silicene derivative, or fullerene, or a fullerene derivative, or combinations thereof, held by a supporting structure.

28. The apparatus according to claim 27, wherein the apparatus further comprises one or more of the following elements:

an illumination system configured to condition a radiation beam;

a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;

a substrate table constructed to hold a substrate; and

a projection system configured to project the patterned radiation beam onto a target portion of the substrate.