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Methods Of Selective Layer Deposition

  • US 20150162214A1
  • Filed: 12/04/2014
  • Published: 06/11/2015
  • Est. Priority Date: 12/09/2013
  • Status: Active Grant
First Claim
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1. A method of selective layer deposition, the method comprising:

  • providing a substrate comprising a first substrate surface and a second substrate surface;

    depositing a first layer of film over the first and second substrate surfaces, wherein the deposition has an incubation delay over the second substrate surface such that the first layer of film over the first substrate surface is thicker than the first layer of film deposited over the second substrate surface; and

    thenetching the first layer of film over the first and second substrate surfaces, wherein the first layer of film over the second substrate surface is at least substantially removed, but the first layer of film over the first substrate is only partially removed.

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