METHOD FOR THIN FILM ENCAPSULATION (TFE) OF A MICROELECTROMECHANICAL SYSTEM (MEMS) DEVICE AND THE MEMS DEVICE ENCAPSULATED THEREOF
First Claim
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1. A method for thin film encapsulation (TFE) of a microelectromechanical system (MEMS) device, comprising:
- providing a substrate;
forming a MEMS device on the substrate;
forming one or more etching channels adjacent to the MEMS device;
providing one or more cavities below the MEMS device; and
forming one or more cavities above the MEMS device.
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Abstract
A method for thin film encapsulation (TFE) of a microelectromechanical system (MEMS) device, including providing a substrate; forming a MEMS device on the substrate; forming one or more etching channels adjacent to the MEMS device; providing one or more cavities below the MEMS device; and forming one or more cavities above the MEMS device.
32 Citations
18 Claims
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1. A method for thin film encapsulation (TFE) of a microelectromechanical system (MEMS) device, comprising:
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providing a substrate; forming a MEMS device on the substrate; forming one or more etching channels adjacent to the MEMS device; providing one or more cavities below the MEMS device; and forming one or more cavities above the MEMS device. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A thin film encapsulated microelectromechanical system (MEMS) device comprising:
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a MEMS device formed on a substrate; one or more cavities formed above and/or below the MEMS device; a cap layer formed over the MEMS device; and a sealing layer formed over the cap layer; wherein one or more etching channels are formed adjacent to the MEMS device and under the cap layer. - View Dependent Claims (16, 17, 18)
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Specification