THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME, ARRAY SUBSTRATE AND DISPLAY DEVICE
First Claim
1. A thin film transistor comprising:
- a substrate;
a gate electrode, a source electrode, a drain electrode and a semiconductor layer formed on the substrate;
a gate insulating layer between the gate electrode and the semiconductor layer or between the gate electrode and the source and drain electrodes;
an etching stop layer between the semiconductor layer and the source and drain electrodes having a source contact hole and a drain contact hole therein; and
a source buffer layer between the source electrode and the semiconductor layer and a drain buffer layer between the drain electrode and the semiconductor layer,wherein the source and drain electrodes are metal Cu electrodes, and the source and drain buffer layers are Cu alloy layer.
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Accused Products
Abstract
A thin film transistor and method for manufacturing the same, an array substrate and a display device are disclosed. The thin film transistor comprises a substrate; a gate electrode, a source electrode, a drain electrode and a semiconductor layer formed on the substrate; a gate insulating layer between the gate electrode and the semiconductor layer or between the gate electrode and the source and drain electrodes; an etching stop layer between the semiconductor layer and the source and drain electrodes having a source contact hole and a drain contact hole therein; and a source buffer layer between the source electrode and the semiconductor layer and a drain buffer layer between the drain electrode and the semiconductor layer. The source and drain electrodes are metal Cu electrodes, and the source and drain buffer layers are Cu alloy layer. The formation of the source and drain buffer layer improves the adhesion of the source and drain electrodes thereon to the semiconductor layer therebeneath, and thus improves the performance of the TFT and image quality.
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Citations
20 Claims
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1. A thin film transistor comprising:
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a substrate; a gate electrode, a source electrode, a drain electrode and a semiconductor layer formed on the substrate; a gate insulating layer between the gate electrode and the semiconductor layer or between the gate electrode and the source and drain electrodes; an etching stop layer between the semiconductor layer and the source and drain electrodes having a source contact hole and a drain contact hole therein; and a source buffer layer between the source electrode and the semiconductor layer and a drain buffer layer between the drain electrode and the semiconductor layer, wherein the source and drain electrodes are metal Cu electrodes, and the source and drain buffer layers are Cu alloy layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. (canceled)
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12. A method for manufacturing a thin film transistor comprising the steps of:
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forming a pattern of a gate electrode, a pattern of a source electrode, a pattern of a drain electrode, and a pattern of a semiconductor layer; forming a pattern of a gate insulating layer and a pattern of an etching stop layer; and forming a pattern of a source buffer layer and a pattern of a drain buffer layer, wherein the gate insulating layer is located between the gate electrode and the semiconductor layer or between the gate electrode and the source and drain electrodes, the etching stop layer is located between the semiconductor layer and the source and drain electrodes and has a source contact hole and a drain contact hole therein, the source and drain buffer layers are located between the source and drain electrodes respectively and the semiconductor layer, and wherein the source and drain electrodes are metal Cu electrodes, and the source and drain buffer layers are Cu alloy layer. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20)
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Specification