METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET
First Claim
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1. A method of metrology target design, the method comprising:
- determining a sensitivity of a parameter of a metrology target design to a perturbation of a process parameter for forming, or measuring the formation of, the metrology target; and
determining a robustness of the metrology target design based on the sensitivity multiplied by the perturbation of the process parameter.
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Abstract
A method of metrology target design is described. The method includes determining a sensitivity of a parameter of a metrology target design to a perturbation of a process parameter for forming, or measuring the formation of, the metrology target, and determining a robustness of the metrology target design based on the sum of the sensitivity multiplied by the perturbation of at least one of the process parameters.
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16 Claims
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1. A method of metrology target design, the method comprising:
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determining a sensitivity of a parameter of a metrology target design to a perturbation of a process parameter for forming, or measuring the formation of, the metrology target; and determining a robustness of the metrology target design based on the sensitivity multiplied by the perturbation of the process parameter. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 16)
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9. A method of metrology target design, the method comprising:
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determining a sensitivity of respective parameter of a plurality of parameters of a metrology target design to a perturbation of a process parameter for forming, or measuring the formation of, the metrology target; and determining a performance indicator for the metrology target design based on a sum of the product of each of the plurality of sensitivities and the perturbation of the process parameter. - View Dependent Claims (10, 11, 12, 13, 14, 15)
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Specification