METHOD AND SYSTEM MANAGING EXECUTION OF PREVENTATIVE MAINTENANCE OPERATION IN SEMICONDUCTOR MANUFACTURING EQUIPMENT
First Claim
1. A method of managing semiconductor manufacturing equipment using an equipment computer, comprising:
- ordering a preventive maintenance operation for a chamber;
determining whether or not the preventive maintenance operation was normally finished using electric reflection coefficients obtained in relation to the chamber in the absence of a plasma reaction; and
then,only after determining that the preventive maintenance operation was normally finished, performing a semiconductor manufacturing process using a plasma reaction in the chamber.
1 Assignment
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Accused Products
Abstract
Provided are a method and a system for managing semiconductor manufacturing equipment. The method may be performed using an equipment computer and may include ordering to perform a preventive maintenance to a chamber and parts in the chamber, monitoring a result of the preventive maintenance to the chamber and the parts, and performing a manufacturing process using plasma reaction in the chamber, if the result of the preventive maintenance is normal. The monitoring the result of the preventive maintenance may include a pre-screening method monitoring the result of the preventive maintenance using electric reflection coefficients obtained from the chamber and the parts without using the plasma reaction.
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Citations
20 Claims
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1. A method of managing semiconductor manufacturing equipment using an equipment computer, comprising:
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ordering a preventive maintenance operation for a chamber; determining whether or not the preventive maintenance operation was normally finished using electric reflection coefficients obtained in relation to the chamber in the absence of a plasma reaction; and
then,only after determining that the preventive maintenance operation was normally finished, performing a semiconductor manufacturing process using a plasma reaction in the chamber. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A management system for semiconductor manufacturing equipment, comprising:
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semiconductor manufacturing equipment including a chamber and a related electrical part; an electric reflection coefficient measuring instrument external to the chamber and connected to the electrical part to provide a control signal; and an equipment computer configured to control execution of a preventative maintenance operation for the chamber using at least one frequency map obtained by providing the control signal to the electrical part with a respective frequency exhibiting a peak value in related to an electric reflection coefficient associated with the part. - View Dependent Claims (16, 17)
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18. A method of managing the application of a preventative maintenance operation to a chamber in an assembly of semiconductor manufacturing equipment, the method comprising:
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before running a semiconductor manufacturing operation, ordering a preventive maintenance operation for a chamber, then determining whether or not the preventive maintenance operation was normally finished using electric reflection coefficients obtained in relation to the chamber in the absence of a plasma reaction; after running the semiconductor manufacturing operation, ordering the preventive maintenance operation for the chamber upon determining that the semiconductor manufacturing operation was not normally performed, and then determining whether or not the preventive maintenance operation was normally finished using electric reflection coefficients obtained in relation to the chamber in the absence of a plasma reaction; and after running the semiconductor manufacturing operation, ordering the preventive maintenance operation for the chamber upon determining that a period for the preventive maintenance operation has been reached, and then determining whether or not the preventive maintenance operation was normally finished using electric reflection coefficients obtained in relation to the chamber in the absence of a plasma reaction. - View Dependent Claims (19, 20)
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Specification