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MARK, METHOD FOR FORMING SAME, AND EXPOSURE APPARATUS

  • US 20150200165A1
  • Filed: 01/06/2015
  • Published: 07/16/2015
  • Est. Priority Date: 07/10/2012
  • Status: Active Grant
First Claim
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1. A mark forming method comprising:

  • forming recessed portion on a mark formation area of a substrate;

    coating the recessed portion with a polymer layer containing a block copolymer;

    allowing the polymer layer in the recessed portion to form a self-assembled area;

    selectively removing a portion of the self-assembled area; and

    forming a positioning mark by using the self-assembled area from which the portion of the self-assembled area has been removed.

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