WAFER OR RETICLE THERMAL DEFORMATION MEASURING TECHNIQUES
First Claim
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1. A system, comprising:
- a wafer stage adapted to hold a semiconductor wafer thereon;
a moveable temperature sensor array configured to move to a plurality of different positions over a surface of the wafer stage and to take a plurality of temperature measurements at the plurality of different positions, respectively; and
a controller adapted to, based on the plurality of temperature measurements, determine an expected thermal deformation for the semiconductor wafer or for a reticle arranged over the semiconductor wafer.
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Abstract
A system includes a wafer stage adapted to hold a semiconductor wafer thereon. A moveable temperature sensor array is configured to move to a plurality of different positions over a surface of the wafer stage and to take a plurality of temperature measurements at the plurality of positions, respectively. Based on the plurality of temperature measurements, a controller is adapted to determine an expected thermal deformation for the semiconductor wafer or for a reticle arranged over the semiconductor wafer.
4 Citations
20 Claims
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1. A system, comprising:
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a wafer stage adapted to hold a semiconductor wafer thereon; a moveable temperature sensor array configured to move to a plurality of different positions over a surface of the wafer stage and to take a plurality of temperature measurements at the plurality of different positions, respectively; and a controller adapted to, based on the plurality of temperature measurements, determine an expected thermal deformation for the semiconductor wafer or for a reticle arranged over the semiconductor wafer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A system, comprising:
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a wafer stage adapted to hold a semiconductor wafer thereon; an illumination source adapted to provide light along an optical axis, where the light is to strike the wafer stage at a location at which the semiconductor wafer is to be held; a moveable reticle stage configured to selectively move a reticle from a first reticle position off the optical axis to a second position on the optical axis; an optical assembly configured to focus light that has passed through the reticle onto a location on the wafer stage where the semiconductor wafer is to be held; a moveable temperature sensor array configured to move to a plurality of different positions over a surface of the wafer stage and to take a plurality of temperature measurements at the plurality of positions, respectively; and a controller adapted to, based on the plurality of temperature measurements, determine an expected thermal deformation for the reticle or the semiconductor wafer. - View Dependent Claims (12, 13, 14, 15, 17)
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18. A method, comprising:
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providing a semiconductor wafer; moving a reticle to a plurality of different positions over a surface of the semiconductor wafer and providing a reticle image on the surface of the semiconductor wafer for each of the plurality of different positions; moving a temperature sensor array to a plurality of different positions over a surface of the semiconductor wafer and taking a plurality of temperature measurements at the plurality of positions, respectively; and based on the plurality of temperature measurements, determining an expected thermal deformation for the wafer or the reticle. - View Dependent Claims (19, 20)
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Specification