CHARGED PARTICLE BEAM APPARATUS AND PROCESSING METHOD
First Claim
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1. A charged particle beam apparatus comprising:
- a charged particle beam column configured to irradiate a charged particle beam; and
a controller configured to control the charged particle beam column to irradiate the charged particle beam at a first pixel interval for a first region and to irradiate the charged particle beam at a second pixel interval different from the first pixel interval for a second region included in the first region.
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Abstract
A charged particle beam apparatus is provided with: a charged particle beam column configured to irradiate a charged particle beam; and a controller configured to control the charged particle beam column to irradiate the charged particle beam at a first pixel interval for a first region and to irradiate the charged particle beam at a second pixel interval different from the first pixel interval for a second region included in the first region.
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Citations
6 Claims
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1. A charged particle beam apparatus comprising:
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a charged particle beam column configured to irradiate a charged particle beam; and a controller configured to control the charged particle beam column to irradiate the charged particle beam at a first pixel interval for a first region and to irradiate the charged particle beam at a second pixel interval different from the first pixel interval for a second region included in the first region. - View Dependent Claims (2, 3, 4, 5)
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6. A processing method comprising:
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controlling a charged particle beam column to irradiate the charged particle beam at a first pixel interval for a first region; and controlling the charged particle beam column to irradiate the charged particle beam at a second pixel interval different from the first pixel interval for a second region included in the first region.
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Specification