CHARGED PARTICLE BEAM APPARATUS AND PROCESSING METHOD

• US 20150206708A1
• Filed: 01/21/2015
• Published: 07/23/2015
• Est. Priority Date: 01/22/2014
• Status: Active Grant

• Current Assignee: Hitachi High-Tech Science Corporation (Hitachi High- Tech Corporation)
• Original Assignee: Hitachi High-Tech Science Corporation (Hitachi High- Tech Corporation)
• Inventors: KOZAKAI, Tomokazu, ARAMAKI, Fumio, MURAMATSU, Masashi
• Granted Patent: US 9,793,092 B2
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: G21K 5/02 having no beam-forming means
• CPC Class Codes: H01J 2237/04 Means for controlling the discharge
• CPC Class Codes: H01J 2237/08 Ion sources
• CPC Class Codes: H01J 2237/15 Means for deflecting or directing discharge
• CPC Class Codes: H01J 2237/2806 Secondary charged particle
• CPC Class Codes: H01J 2237/317 Processing objects on a microscale
• CPC Class Codes: H01J 37/222 Image processing arrangements associated with the tube
• CPC Class Codes: H01J 37/28 with scanning beams H01J37/268, H01J37/292, H01J37/2955 take precedence
• CPC Class Codes: H01J 37/304 Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Abstract

A charged particle beam apparatus is provided with: a charged particle beam column configured to irradiate a charged particle beam; and a controller configured to control the charged particle beam column to irradiate the charged particle beam at a first pixel interval for a first region and to irradiate the charged particle beam at a second pixel interval different from the first pixel interval for a second region included in the first region.

Claims

1. A charged particle beam apparatus comprising:

a charged particle beam column configured to irradiate a charged particle beam; and

a controller configured to control the charged particle beam column to irradiate the charged particle beam at a first pixel interval for a first region and to irradiate the charged particle beam at a second pixel interval different from the first pixel interval for a second region included in the first region.

2. The charged particle beam apparatus according to claim 1,

wherein the second region is a correction mark detection region that includes a position at which correction mark is provided.

3. The charged particle beam apparatus according to claim 1,

wherein the controller controls the charged particle beam column to perform an irradiation process of irradiating the charged particle beam once for each pixel region designated in a bitmap for multiple times while displacing an irradiation position of the charged particle beam within each pixel region for each of the irradiation process for each pixel.

4. The charged particle beam apparatus according to claim 3,

wherein the controller operates to:

control the charged particle beam column to perform scanning of a drift correction region with a first pixel pitch that is smaller than a second pixel pitch of the bitmap;

calculate a first amount of drift correction based on information obtained through the scanning; and

perform drift correction by converting the first amount of drift correction into a second amount of drift correction for the second pixel pitch of the bitmap.

5. The charged particle beam apparatus according to claim 3,

wherein when a field of view of the bitmap is set to FOV_A and a field of view having an amount, by which the irradiation position is displaced, the same with a pixel size is set to FOV_B, the controller controls the charged particle beam column to perform the irradiation process for at least (FOV_A/FOV_B) by (FOV_A/FOV_B) times in total within the first region.

6. A processing method comprising:

controlling a charged particle beam column to irradiate the charged particle beam at a first pixel interval for a first region; and

controlling the charged particle beam column to irradiate the charged particle beam at a second pixel interval different from the first pixel interval for a second region included in the first region.