DROPLET QUANTITY DETERMINATION METHOD AND MEASURING DEVICE

• US 20150211996A1
• Filed: 04/07/2015
• Published: 07/30/2015
• Est. Priority Date: 11/13/2012
• Status: Abandoned Application

• Current Assignee: Murata Manufacturing Co Limited
• Original Assignee: Murata Manufacturing Co Limited
• Inventors: KAMBA, SEIJI
• Application Number:
  US14/680,398
• Publication Number:
  US 20150211996A1
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: G01N 2021/035 Supports for sample drops
• CPC Class Codes: G01N 21/3581 using far infrared light; using Terahertz radiation
• CPC Class Codes: G01N 21/59 Transmissivity G01N21/25 takes precedence
• CPC Class Codes: G01N 2201/061 Sources
• CPC Class Codes: G01N 2201/12 Circuits of general importance; Signal processing

Abstract

A droplet quantity determination method that includes processes of holding a droplet on a first principal surface of an aperture-arranged structure, emitting electromagnetic waves to the droplet, and determining a quantity of the droplet based on a change in the electromagnetic waves due to the presence of the droplet.

Claims

1. A droplet quantity determination method comprising:

emitting an electromagnetic wave to a droplet as a measurement target substance on a first principal surface of an aperture-arranged structure having the first principal surface and a second principal surface which opposes the first principal surface and also having a plurality of aperture sections which penetrate through the aperture-arranged structure from the first principal surface toward the second principal surface such that the electromagnetic wave is absorbed or reflected by the droplet; and

determining a quantity of the droplet based on a change between a reference electromagnetic wave emitted toward the aperture-arranged structure on which the droplet is not held and a the electromagnetic wave being emitted when the droplet is held on the aperture-arranged structure.

2. The droplet quantity determination method according to claim 1,

wherein the quantity of the droplet is determined in accordance with changes in transmittance and/or reflectance characteristics of the electromagnetic wave.

3. The droplet quantity determination method according to claim 2,

wherein the first principal surface of the aperture-arranged structure is modified to hold the droplet.

4. The droplet quantity determination method according to claim 3,

wherein modification of the first principal surface of the aperture-arranged structure is providing a material layer having affinity for the droplet.

5. The droplet quantity determination method according to claim 1,

wherein the first principal surface of the aperture-arranged structure is modified to hold the droplet.

6. The droplet quantity determination method according to claim 5,

wherein modification of the first principal surface of the aperture-arranged structure is providing a material layer having affinity for the droplet.

7. The droplet quantity determination method according to claim 1,

wherein a size of the plurality of aperture sections is set such that the droplet does not pass therethrough.

8. A droplet measuring device comprising:

an aperture-arranged structure that includes a first principal surface on which a droplet as a measurement target substance is held, a second principal surface opposing the first principal surface, and a plurality of aperture sections which penetrate through the aperture-arranged structure from the first principal surface toward the second principal surface;

an electromagnetic wave emitting unit that emits electromagnetic waves to the first principal surface of the aperture-arranged structure; and

a detection unit that detects an electromagnetic wave that is absorbed or reflected by the droplet in the aperture-arranged structure and converts the detected electromagnetic wave to an electric signal.

9. The droplet measuring device according to claim 8, further comprising:

an analysis processing unit that is supplied with the electric signal from the detection unit and determines a quantity of the droplet based on a change in the electric signal between a reference electromagnetic wave emitted toward the aperture-arranged structure on which the droplet is not held and the electromagnetic wave emitted when the droplet is held on the aperture-arranged structure.

10. The droplet measuring device according to claim 9,

wherein the first principal surface of the aperture-arranged structure is modified to hold the droplet.

11. The droplet measuring device according to claim 10,

wherein modification is a material layer having affinity for the droplet.

12. The droplet measuring device according to claim 8,

wherein the first principal surface of the aperture-arranged structure is modified to hold the droplet.

13. The droplet measuring device according to claim 12,

wherein modification is a material layer having affinity for the droplet.

14. The droplet measuring device according to claim 8,

wherein the plurality of aperture sections have a size that do not allow the droplet to pass therethrough.