METHOD AND APPARATUS FOR MODIFIED CELL ARCHITECTURE AND THE RESULTING DEVICE

• US 20150213184A1
• Filed: 01/24/2014
• Published: 07/30/2015
• Est. Priority Date: 01/24/2014
• Status: Active Grant

• Current Assignee: Globalfoundries US Incorporated (GlobalFoundries, Inc.)
• Original Assignee: GlobalFoundries, Inc.
• Inventors: YUAN, Lei, RASHED, Mahbub, KYE, Jongwook
• Granted Patent: US 9,292,647 B2
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: G06F 30/394 Routing G06F30/396 takes precedence

Abstract

A methodology for a modified cell architecture and the resulting devices are disclosed. Embodiments may include determining a first vertical track spacing for a plurality of first routes for an integrated circuit (IC) design, each of the plurality of first routes having a first width, determining a second vertical track spacing for a second route for the IC design, the second route having a second width, and designating a cell vertical dimension for the IC design based on the first and second vertical track spacings.

Claims

1. A method comprising:

determining a first vertical track spacing for a plurality of first routes for an integrated circuit (IC) design, each of the plurality of first routes having a first width;

determining a second vertical track spacing for a second route for the IC design, the second route having a second width; and

designating a cell vertical dimension for the IC design based on the first and second vertical track spacings.

2. The method according to claim 1, further comprising:

initiating a placement of the plurality of first routes extending horizontally in the cell and each being placed on one of a plurality of equally spaced vertical track positions of the cell with the first vertical track spacing.

3. The method according to claim 2, further comprising:

initiating a placement of the second route extending horizontally in the cell and being placed on a top or bottom vertical track position of the cell.

4. The method according to claim 3, wherein the top and bottom vertical track positions are spaced from the plurality of equally spaced vertical track positions by the second vertical track spacing, and wherein a separation distance between the second route and an adjacent first route of the plurality of first routes is equal to the separation distance between two adjacent first routes of the plurality of first routes.

5. The method according to claim 1, further comprising:

determining the first width based on a minimum metal width of a double patterning process; and

determining the first vertical track spacing based on a minimum second metal (M2) pitch of the double patterning process,

wherein the cell vertical dimension is not equal to an integer multiple of the minimum M2 pitch.

6. The method according to claim 1, further comprising:

determining the second width based on an electro-migration (EM) and IR-drop effect; and

designating the second route as a power or ground rail for the IC design.

7. The method according to claim 1, further comprising:

designating a plurality of cells in the IC design, each of the cells having the designated cell vertical dimension and comprising;

the plurality of first routes extending horizontally and each being placed on one of the plurality of equally spaced vertical track positions of the cell with the first vertical track spacing; and

the second route extending horizontally and being placed on a top or bottom vertical track position of the cell.

8. The method according to claim 7, wherein at least one of the cells comprises the second route having the second width, extending horizontally in the cell and being placed on a top or bottom vertical track position of the IC design.

9. The method according to claim 8, wherein the at least one of the cells further comprises:

a third route having the second width, extending horizontally in the IC design and being placed on the top or bottom vertical track position of the IC design,

wherein the second and third routes are positioned at opposite boundaries of the cell.

10. An apparatus comprising:

at least one processor; and

at least one memory including computer program code for one or more programs,

the at least one memory and the computer program code configured to, with the at least one processor, cause the apparatus to perform at least the following,

determine a first vertical track spacing for a plurality of first routes for an integrated circuit (IC) design, each of the plurality of first routes having a first width;

determine a second vertical track spacing for a second route for the IC design, the second route having a second width; and

designate a cell vertical dimension for the IC design based on the first and second vertical track spacings.

11. The apparatus according to claim 10, wherein the apparatus is further caused to:

initiate a placement of the plurality of first routes extending horizontally in the cell and each being placed on one of a plurality of equally spaced vertical track positions of the cell with the first vertical track spacing.

12. The apparatus according to claim 11, wherein the apparatus is further caused to:

initiate a placement of the second route extending horizontally in the cell and being placed on a top or bottom vertical track position of the cell.

13. The apparatus according to claim 12, wherein the top and bottom vertical track positions are spaced from the plurality of equally spaced vertical track positions by the second vertical track spacing, and wherein a separation distance between the second route and an adjacent first route of the plurality of first routes is equal to the separation distance between two adjacent first routes of the plurality of first routes.

14. The apparatus according to claim 10, wherein the apparatus is further caused to:

determine the first width based on a minimum metal width of a double patterning process; and

determine the first vertical track spacing based on a minimum second metal (M2) pitch of the double patterning process,

wherein the cell vertical dimension is not equal to an integer multiple of the minimum M2 pitch.

15. The apparatus according to claim 10, wherein the apparatus is further caused to:

determine the second width based on an electro-migration (EM) and IR-drop effect; and

designate the second route as a power or ground rail for the IC design.

16. The apparatus according to claim 10, wherein the apparatus is further caused to:

designate a plurality of cells in the IC design, each of the cells having the designated cell vertical dimension and comprising;

the plurality of first routes extending horizontally and each being placed on one of the plurality of equally spaced vertical track positions of the cell with the first vertical track spacing; and

the second route extending horizontally and being placed on a top or bottom vertical track position of the cell.

17. The apparatus according to claim 10, wherein at least one of the cells comprises the second route having the second width, extending horizontally in the cell and being placed on a top or bottom vertical track position of the IC design.

18. The apparatus according to claim 17, wherein the at least one of the cells further comprises:

a third route having the second width, extending horizontally in the IC design and being placed on the top or bottom vertical track position of the IC design,

wherein the second and third routes are positioned at opposite boundaries of the cell.

19. A method comprising:

determining a first vertical track spacing for a plurality of first routes for an integrated circuit (IC) design, each of the plurality of first routes having a first width;

determining a second vertical track spacing for a second route for the IC design, the second route having a second width;

designating a cell vertical dimension for the IC design based on the first and second vertical track spacings;

initiating a placement of the plurality of first routes extending horizontally in the cell and each being placed on one of a plurality of equally spaced vertical track positions of the cell with the first vertical track spacing;

initiating a placement of the second route extending horizontally in the cell and being placed on a top or bottom vertical track position of the cell;

determining the first width based on a minimum metal width of a double patterning process;

determining the second width based on an electro-migration (EM) and IR-drop effect; and

designating the second route as a power or ground rail for the IC design.

20. The method according to claim 19, wherein the at least one of the cells further comprises:

a third route having the second width, extending horizontally in the IC design and being placed on the top or bottom vertical track position of the IC design,

wherein the second and third routes are positioned at opposite boundaries of the cell.