Thin FilmTransistor, Array Substrate, And Manufacturing Method Thereof
First Claim
1. A thin film transistor, comprising a substrate and a gate electrode, a gate insulating layer, a semiconductor layer, a protective layer, an ohmic contact layer, a source electrode and a drain electrode successively stacked on the substrate, wherein the protective layer has two via holes over the semiconductor layer so as to expose the underlying semiconductor layer, the semiconductor layer exposed by the via hole is covered by the ohmic contact layer;
- the source and drain electrodes are connected to the semiconductor layer through the ohmic contact layer at the via hole.
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Accused Products
Abstract
A thin film transistor, an array substrate (1) and a manufacturing method thereof are provided. The thin film transistor comprises a substrate (1) and a gate electrode (2), a gate insulating layer (3), a semiconductor layer (4), a protective layer (5), an ohmic contact layer (6), a source electrode (7) and a drain electrode (8) successively stacked on the substrate (1), wherein the protective layer (5) has two via holes (11) over the semiconductor layer (4) so as to expose the underlying semiconductor layer (4), the semiconductor layer (4) exposed by the via hole (11) is covered by the ohmic contact layer (6); the source and drain electrodes (7, 8) are connected to the semiconductor layer (4) through the ohmic contact layer (6) at the via hole (11).
11 Citations
13 Claims
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1. A thin film transistor, comprising a substrate and a gate electrode, a gate insulating layer, a semiconductor layer, a protective layer, an ohmic contact layer, a source electrode and a drain electrode successively stacked on the substrate, wherein the protective layer has two via holes over the semiconductor layer so as to expose the underlying semiconductor layer, the semiconductor layer exposed by the via hole is covered by the ohmic contact layer;
- the source and drain electrodes are connected to the semiconductor layer through the ohmic contact layer at the via hole.
- View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A manufacturing method of an array substrate, comprising the steps of:
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S1, forming patterns including a gate line, a gate electrode, a gate insulating layer and a semiconductor layer on a substrate; S2, forming a pattern of a protective layer, the protective layer having two via holes formed therein at locations opposed to the semiconductor layer so as to expose the semiconductor layer; S3, forming patterns including an ohmic contact layer, a data line, a source electrode, and a drain electrode, wherein the ohmic contact layer is formed on at least the semiconductor layer exposed by the via holes, the source and drain electrodes are connected to the semiconductor layer through the ohmic contact layer at the via holes; S4, forming a pattern of a passivation layer, wherein the passivation layer has a gate line interface via hole and a data line interface via hole provided therein; and S5, forming a pattern of a pixel electrode. - View Dependent Claims (9, 10, 11, 12, 13)
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Specification