METHOD OF MANUFACTURING OXIDE CRYSTAL THIN FILM
First Claim
1. A method for manufacturing an oxide crystal thin film, comprisingcarrying raw material fine particles to a film forming chamber by means of a carrier gas, the raw material fine particles being formed from a raw material solution comprising water and at least one of a gallium compound and an indium compound, and forming an oxide crystal thin film on a sample on which films are to be formed, the sample being placed in the film forming chamber,wherein at least one of the gallium compound and the indium compound is bromide or iodide.
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Accused Products
Abstract
There is provided a thin film manufacturing method which allows both a reduction in the carbon impurity concentration and a high film forming speed, as well as allows separate formation of stable crystal structures. There is provided a method for manufacturing an oxide crystal thin film. The method includes carrying raw material fine particles to a film forming chamber by means of a carrier gas, the raw material fine particles being formed from a raw material solution including water and at least one of a gallium compound and an indium compound, and forming an oxide crystal thin film on a sample on which films are to be formed, the sample being placed in the film forming chamber. At least one of the gallium compound and the indium compound is bromide or iodide.
18 Citations
10 Claims
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1. A method for manufacturing an oxide crystal thin film, comprising
carrying raw material fine particles to a film forming chamber by means of a carrier gas, the raw material fine particles being formed from a raw material solution comprising water and at least one of a gallium compound and an indium compound, and forming an oxide crystal thin film on a sample on which films are to be formed, the sample being placed in the film forming chamber, wherein at least one of the gallium compound and the indium compound is bromide or iodide.
Specification