INTEGRATED DEVICE COMPRISING VIA WITH SIDE BARRIER LAYER TRAVERSING ENCAPSULATION LAYER
First Claim
1. An integrated device comprising:
- an encapsulation layer;
a via structure traversing the encapsulation layer, wherein the via structure comprises;
a via comprising a first side, a second side, and a third side; and
a barrier layer surrounding at least the first side and the third side of the via; and
a pad directly coupled to the barrier layer of the via structure.
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Accused Products
Abstract
Some novel features pertain to an integrated device that includes an encapsulation layer, a via structure traversing the encapsulation layer, and a pad. The via structure includes a via that includes a first side, a second side, and a third side. The via structure also includes a barrier layer surrounding at least the first side and the third side of the via. The pad is directly coupled to the barrier layer of the via structure. In some implementations, the integrated device includes a first dielectric layer coupled to a first surface of the encapsulation layer. In some implementations, the integrated device includes a substrate coupled to a first surface of the encapsulation layer. In some implementations, the integrated device includes a first die coupled to the substrate, where the encapsulation layer encapsulates the first die. In some implementations, the via includes a portion configured to operate as a pad.
16 Citations
30 Claims
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1. An integrated device comprising:
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an encapsulation layer; a via structure traversing the encapsulation layer, wherein the via structure comprises; a via comprising a first side, a second side, and a third side; and a barrier layer surrounding at least the first side and the third side of the via; and a pad directly coupled to the barrier layer of the via structure. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. An apparatus comprising:
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an encapsulation layer; a via structure traversing the encapsulation layer, wherein the via structure comprises; a via comprising a first side, a second side, and a third side; and a barrier means surrounding at least the first side and the third side of the via; and a pad directly coupled to the barrier layer of the via structure. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20)
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21. A method for fabricating an integrated device, comprising:
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forming a pad on a substrate; forming an encapsulation layer on the substrate; and forming a via structure in the encapsulation layer, wherein forming the via structure comprises; forming a barrier layer in the encapsulation layer; and forming a via on the barrier layer, the via comprising a first side, a second side, and a third side, the via is formed on the barrier layer such that the barrier layer surrounds at least the first side and the third side of the via, wherein the barrier layer is directly coupled to the pad. - View Dependent Claims (22, 23, 24, 25, 26, 27, 28, 29, 30)
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Specification