Reticle Cooling System In A Lithographic Apparatus

• US 20150241796A1
• Filed: 04/29/2015
• Published: 08/27/2015
• Est. Priority Date: 10/31/2012
• Status: Active Grant

• Current Assignee: ASML Holding NV
• Original Assignee: ASML Holding NV, ASML Netherlands BV (ASML Holding NV)
• Inventors: EBERT, Earl William Jr., ONVLEE, Johannes, NAYFEH, Samir A., SCHUSTER, Mark Josef, DELMASTRO, Peter A., WARD, Christopher Charles, VAN BOXTEL, Frank Johannes Jacobus, ALIKHAN, Abdullah, BURBANK, Daniel Nathan, GALBURT, Daniel Nicholas, VERDIRAME, Justin Matthew, VENTURINO, Thomas
• Granted Patent: US 9,632,434 B2
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70808 Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
• CPC Class Codes: G03F 7/70858 Environment aspects, e.g. pressure of beam-path gas, temperature pollution aspects G03F7/70916
• CPC Class Codes: G03F 7/70866 of mask or workpiece
• CPC Class Codes: G03F 7/70875 Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

Abstract

A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.

Claims

1. A lithographic system comprising:

a patterning device support comprising a movable component configured to support a patterning device;

a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device, the reticle cooling system comprising;

a first array of gas inlets configured to provide a first gas flow along a first direction across a surface of the patterning device;

a second array of gas inlets configured to provide a second gas flow along a second direction across the surface of the patterning device, the first and second directions being opposite to each other; and

a switching control system configured to control operation of the first and second arrays of gas inlets.

2. The lithographic system of claim 1, wherein the reticle cooling system further comprises a temperature measurement system configured to detect temperature of an area of the patterning device and generate a measurement signal;

and

wherein the switching control system is configured to switch operation between the first and second arrays of gas inlets based on the measurement signal.

3. The lithographic system of claim 1, wherein the switching control system is configured to switch operation between the first and second arrays of gas inlets at predetermined time intervals during operational use.

4. The lithographic system of claim 1, wherein the first array of gas inlets is disposed along a first side of the patterning device support;

and

wherein the second array of gas inlets is disposed along a second side of the patterning device support.

5. The lithographic system of claim 1, wherein the first and second arrays of gas inlets are configured to move with the patterning device during operational use.

6. The lithographic system of claim 1, wherein the reticle cooling system further comprises a gas system configured to supply gas for the first and second gas flows through the first and second arrays of gas inlets;

and

wherein the switching control system is configured to control operation of the gas system based on the measurement signal.

7. The lithographic system of claim 1, further comprising a fixed purge plate located above the patterning device.

8. The lithographic system of claim 7, wherein the reticle cooling system further comprises:

a first gas outlet, coupled to the fixed purge plate, configured to extract the first gas flow; and

a second gas outlet, coupled to the fixed purge plate, configured to extract the second gas flow.

9. The lithographic system of claim 8, further comprising a gas system configured to extract gas from the first and second gas flows through the first and second gas outlets, respectively.

10. The lithographic system of claim 1, wherein the temperature measurement system comprises:

a temperature sensor configured to detect the temperature of the area of the patterning device; and

a controller configured to generate the measurement signal based on the detected temperature.

11. The lithographic system of claim 1, wherein gas in the first and second gas flows comprises helium.

12. The lithographic system of claim 1, wherein the movable component is a short stroke module configured to move the patterning device.

13. A system to control a temperature of a patterning device in a lithographic apparatus, the system comprising:

a patterning device support comprising a movable component configured to support a patterning device;

a fixed purge plate located above the patterning device;

a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device, the reticle cooling system comprising;

a temperature measurement system configured to detect temperature of an area of the patterning device and generate a measurement signal;

a switching control system configured to generate a control signal based on the measurement signal; and

a gas system configured to;

supply a gas for forming a first gas flow along a first direction across a surface of the patterning device in response to the control signal;

or

supply the gas for forming a second gas flow along a second direction across the surface of the patterning device in response to the control signal, the first and second directions being opposite to each other.

14. The system of claim 13, wherein the reticle cooling system further comprises:

a first array of gas inlets configured to direct the first gas flow along the first direction across the surface of the patterning device; and

a second array of gas inlets configured to direct the second gas flow along the second direction across the surface of the patterning device.

15. The system of claim 14, wherein the switching control system is configured to switch operation between the first and second arrays of gas inlets based on the measurement signal.

16. The system of claim 14, wherein the switching control system is configured to switch operation between the first and second arrays of gas inlets at predetermined time intervals during operational use.

17. The system of claim 13, wherein the first array of gas inlets is disposed along a first side of the patterning device support;

and

wherein the second array of gas inlets is disposed along a second side of the patterning device support.

18. The system of claim 13, wherein the reticle cooling system further comprises:

a first gas outlet, coupled to the fixed purge plate, configured to extract the first gas flow; and

a second gas outlet, coupled to the fixed purge plate, configured to extract the second gas flow.

19. The system of claim 13, wherein the temperature measurement system comprises:

a temperature sensor configured to detect the temperature of the area of the patterning device; and

a controller configured to generate the measurement signal based on the detected temperature.

20. A lithographic apparatus comprising:

an illumination system configured to condition a radiation beam;

a patterning device support comprising a movable component configured to support a patterning device;

a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device, the reticle cooling system comprising;

a first array of gas inlets, disposed along a first side of the patterning device support, configured to provide a first gas flow across a surface of the patterning device;

a second array of gas inlets, disposed along a second side of the patterning device support, configured to provide a second gas flow across the surface of the patterning device, the first and second sides being opposite to each other; and

a switching control system configured to control operation of the first and second arrays of gas inlets.