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Reticle Cooling System In A Lithographic Apparatus

  • US 20150241796A1
  • Filed: 04/29/2015
  • Published: 08/27/2015
  • Est. Priority Date: 10/31/2012
  • Status: Active Grant
First Claim
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1. A lithographic system comprising:

  • a patterning device support comprising a movable component configured to support a patterning device;

    a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device, the reticle cooling system comprising;

    a first array of gas inlets configured to provide a first gas flow along a first direction across a surface of the patterning device;

    a second array of gas inlets configured to provide a second gas flow along a second direction across the surface of the patterning device, the first and second directions being opposite to each other; and

    a switching control system configured to control operation of the first and second arrays of gas inlets.

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