MANUFACTURING METHOD FOR SINGLE-SIDED MULTI-LAYER CIRCUIT PATTERN FOR TOUCH PANEL

• US 20150253901A1
• Filed: 02/16/2015
• Published: 09/10/2015
• Est. Priority Date: 03/07/2014
• Status: Abandoned Application

• Current Assignee: CN Innovations Holdings Hong Kong Limited
• Original Assignee: CN Innovations Holdings Hong Kong Limited
• Inventors: CHAN, Winston
• Application Number:
  US14/623,172
• Publication Number:
  US 20150253901A1
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: C03C 17/2453 Coating containing SnO2
• CPC Class Codes: C03C 17/3417 all coatings being oxide coatings
• CPC Class Codes: C03C 17/36 at least one coating being a metal
• CPC Class Codes: C03C 2217/72 Decorative coatings
• CPC Class Codes: C03C 2217/948 Layers comprising indium tin oxide [ITO]
• CPC Class Codes: C03C 2218/328 Partly or completely removing a coating
• CPC Class Codes: G06F 2203/04103 Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
• CPC Class Codes: G06F 2203/04111 Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate
• CPC Class Codes: G06F 3/0443 using a single layer of sensing electrodes
• CPC Class Codes: G06F 3/0446 using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes

Abstract

A manufacturing method for a single-sided multi-layer mutual capacitance touch circuit structure uses selective laser processing. The structure that is created includes two conducting layers on the same side of a transparent non-conducting substrate, with isolation substructures providing the required electrical isolation at the cross-over points of the circuits and electrodes on the two conducting layers. By using selective laser processing, the structure is selectively etched and cures any part of any layer in a multi-layer structure without damaging neighboring regions and other layers.

Claims

1. A method for manufacturing a single-sided, multi-layer, mutual capacitance touch panel using a selective laser process comprising:

printing artwork on a glass substrate;

applying a first conducting layer on the glass substrate including the artwork;

performing selective laser etching on the first conducting layer, wherein etching the conducting layer creates electrically isolating gaps, and wherein a majority of the conducting layer remains on an un-etched region;

applying an overcoat and a photoresist on the insulating layer;

coating an insulating layer and performing selective laser curing on the overcoat formed on the insulating layer and the photoresist formed on the insulating layer, wherein the selective laser curing cures a specific region of the overcoat and the photoresist without affecting neighboring regions or a material layer located beneath a circuit region;

applying a second conducting layer and/or a plurality of conducting layers on the glass substrate including the first conducting layer and the insulating layer;

performing selective laser etching on the second conducting layer and/or a plurality of conducting layers, wherein a complete touch circuit is produced;

depositing a plurality of metal layers on metal lead regions located at edges of a process pattern;

creating parallel electrically isolating gaps on the second conducting layer and/or a plurality of conducting layers;

performing selective laser etching on the metal lead regions thereby creating patterning for the complete touch circuit; and

applying a protective layer to the complete touch circuit.

2. The method of claim 1, wherein the first conducting layer and at least the second conducting layer are transparent,

wherein the first conducting layer and at least the second conducting layer have a thickness of 10-100 nm, and

wherein the first conducting layer and at least the second conducting layer are configured of conductive materials selected from indium tin oxide (ITO), zinc peroxide (ZnO₂), carbon nanotubes, and silver nanowires, and any conducting material having a comparable electrical conductivity to the electrical conductivity of at least one of ITO, ZnO₂, carbon nanotubes and silver nanowires.

3. The method of claim 1, wherein the first conducting layer includes at least two parallel electrically isolating gaps, and wherein each electrically isolating gap has a length of 0.05-0.5 mm, a width of 0.001-0.3 mm, and a distance between the two parallel gaps of 0.01-0.5 mm.

4. The method of claim 1, further comprising:

forming a plurality of insulating blocks on top of the plurality of the electrically isolating gaps by performing inkjet printing,

wherein each insulating block is configured to have a length of 0.05-1 mm and a width of 0.05-1 mm, and

wherein each insulating block includes a light sensitive insulating photoresist selected from a silicon-based resin, an acrylic-based resin, and any insulating and transparent material for jet-printing; and

exposing each insulating block to a laser, thereby refining the plurality of insulating blocks, wherein each insulating block is configured to have a length of 0.05-0.6 mm, a width of 0.05-0.6 mm, and a thickness of 0.5-5 μ

m.

5. The method of claim 1, wherein the plurality of metal layers have a thickness of 1-7 μ

m and are made of a low resistance material selected from silver paste, copper paste, and carbon paste, and any material having a comparable electrical conductivity to at least one of silver paste, copper paste, and carbon paste.

6. The method of claim 1, wherein the protective layer has a thickness of 10-6000 nm, and wherein the protective layer is made of an insulating material.

7. The method of claim 1, wherein the protective layer is manufactured using inkjet printing, has a thickness of 0.05-7 μ

m, and wherein the protective layer includes a silicon-based or an acrylic-based photoresist insulating material.

8. The method of claim 1, further comprising creating patterning on flexible substrates, wherein the flexible substrate includes at least one of glass, poly(methyl methacrylate) (PMMA), polycarbonate (PC), polyethylene terephthalate (PET) film.

9. The method of claim 1, further comprising creating patterning on a flat surface substrate or a curved surface substrate.

10. The method of claim 1, wherein the selective laser process is compatible with a touch manufacturing sheet type process and a cell type process.

11. The method of claim 1, wherein the selective laser process is performed on touch panels having any color.

12. The method of claim 1, further comprising creating patterning on a transparent substrate made of a conducting material selected from indium tin oxide (ITO), Poly(3,4-ethylenedioxythiophene) (PEDOT), carbon nanotubes, and a nano-silver.

13. The method of claim 1, further comprising using selective laser processing to produce circuits for application in other fields of technology.