SUBSTRATE BAKING DEVICE AND TEMPERATURE ADJUSTING METHOD THEREOF
First Claim
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1. A substrate baking device, comprising:
- a baking device body having a hot plate composed of a plurality of subplates for baking a substrate, anda temperature adjusting mechanism for adjusting heating temperatures of the plurality of subplates of the baking device body.
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Abstract
The present disclosure discloses a substrate baking device and a method for adjusting temperatures thereof. The substrate baking device comprises a baking device body having a hot plate composed of a plurality of subplates for baking a substrate, and a temperature adjusting mechanism for adjusting heating temperatures in the plurality of subplates of the baking device body. A heat conducting layer is arranged on the hot plate to cover the plurality of subplates. The substrate baking device is capable of improving film thickness uniformity.
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Citations
18 Claims
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1. A substrate baking device, comprising:
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a baking device body having a hot plate composed of a plurality of subplates for baking a substrate, and a temperature adjusting mechanism for adjusting heating temperatures of the plurality of subplates of the baking device body. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method for adjusting a temperature of a substrate baking device,
the substrate baking device comprising a baking device body having a hot plate composed of a plurality of subplates for baking a substrate, and a temperature adjusting mechanism for adjusting heating temperatures of the plurality of subplates of the baking device body, and the method comprising the following steps: -
detecting, after a first photolithography process, residual film thicknesses in a plurality of regions of the substrate through the temperature adjusting mechanism; calculating corresponding temperature compensation values according to the relationship between residual film thickness and temperature; and adjusting, through the temperature adjusting mechanism, the heating temperatures of the plurality of subplates of the baking device body according to the temperature compensation values. - View Dependent Claims (8, 9, 10, 11, 12)
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13. A method for adjusting heating temperatures of the substrate baking device,
the substrate baking device comprising a baking device body having a hot plate composed of a plurality of subplates for baking the substrate, and a temperature adjusting mechanism for adjusting the heating temperatures in the plurality of subplates of the baking device body, a heat conducting layer being arranged on the hot plate to cover the plurality of subplates, the method comprising the following steps: -
detecting, after a first photolithography process, residual film thicknesses in a plurality of regions of the substrate through the temperature adjusting mechanism; calculating corresponding temperature compensation values according to the relationship between residual film thickness and temperature; and adjusting, through the temperature adjusting mechanism, the heating temperatures of the plurality of subplates of the baking device body according to the temperature compensation values. - View Dependent Claims (14, 15, 16, 17, 18)
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Specification