APPARATUS AND METHOD FOR INSPECTING A SURFACE OF A SAMPLE

• US 20150270095A1
• Filed: 10/24/2013
• Published: 09/24/2015
• Est. Priority Date: 10/25/2012
• Status: Active Grant

• Current Assignee: Technische Universiteit Delft
• Original Assignee: Technische Universiteit Delft
• Inventors: Kruit, Pieter
• Granted Patent: US 9,449,789 B2
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: G01N 2223/33 scanning, i.e. relative motion for measurement of successive object-parts
• CPC Class Codes: G01N 2223/3307 source and detector fixed; object moves
• CPC Class Codes: G01N 2223/413 sensor array [CCD]
• CPC Class Codes: G01N 2223/418 electron microscope
• CPC Class Codes: G01N 23/2251 using incident electron beams, e.g. scanning electron microscopy [SEM]
• CPC Class Codes: H01J 2237/2446 Position sensitive detectors
• CPC Class Codes: H01J 37/244 Detectors; Associated components or circuits therefor
• CPC Class Codes: H01J 37/28 with scanning beams H01J37/268, H01J37/292, H01J37/2955 take precedence
• CPC Class Codes: H01J 37/3177 Multi-beam, e.g. fly's eye, comb probe

Abstract

The invention relates to an apparatus and method for inspecting a sample. The apparatus comprises a generator for generating an array of primary charged particle beams (33), and a charged particle optical system with an optical axis (38). The optical system comprises a first lens system (37, 310) for focusing all primary beams (33) into a first array of spots in an intermediate plane, and a second lens system (313, 314) for focusing all primary beams (33) into a second array of spots on the sample surface (315). The apparatus comprises a position sensitive backscattered charged particle detector (311) positioned at or near the intermediate plane. The second lens system comprises an electromagnetic or electrostatic lens which is common for all charged particle beams. Preferably the second lens system comprises a magnetic lens for rotating the array of primary beams (33) around the optical axis (38) to position the second array of charged particle spots with respect to the first array at an angle.

Claims

1. An apparatus for inspecting a surface of a sample, wherein the apparatus comprises a multi beam charged particle generator for generating an array of primary charged particle beams, and a charged particle optical system with an optical axis comprising:

a first lens system for focusing the primary charged particle beams into a first array of separated spots in an intermediate plane, and

a second lens system for directing the primary charged particle beams from the intermediate plane towards the sample surface and which comprises an electromagnetic or electrostatic objective lens which is common for at least the primary charged particle beams for focusing all primary charged particle beams into a second array of individual spots on the sample surface,

wherein the apparatus comprises a position sensitive backscatter charged particle detector positioned in or near the intermediate plane, wherein said detector comprises one or more through openings for passing said primary charged particle beams there through, and wherein said second lens system is arranged for projecting backscattered charged particles from the second array of individual spots on the sample surface into an array of backscattered charged particle spots on the detector

2. Apparatus according to claim 1, wherein said one or more through openings comprises an array of holes wherein each hole of the array of holes is arranged for passing one of said array of primary charged particle beams there through.

3. Apparatus according to claim 2, wherein the diameter of the holes of the array of holes is substantially smaller than the pitch between the holes.

4. Apparatus according to claim 1, wherein the second lens system comprises one or more magnetic lenses which are arranged for rotating the array of primary charged particle beams around the optical axis on their way from said intermediate plane towards the sample, to position the second array with respect to the first array at an angle larger than 0 degrees and preferably smaller than 180 degrees around the optical axis.

5. Apparatus according to claim 4, wherein the one or more magnetic lenses are arranged for rotating the array of backscattered charged particle spots with respect to the first array at an angle larger than 0 degrees and preferably smaller than 360 degrees around the optical axis.

6. Apparatus according to claim 5, wherein the one or more magnetic lenses are arranged for rotating the array of backscattered charged particle spots with respect to the first array at an angle of substantially 180 degrees around the optical axis.

7. Apparatus according to claim 6, wherein the detector comprises one through opening for passing said primary charged particle beams there through.

8. Apparatus according to claim 1, wherein the second lens system is arranged for projecting the backscatter charged particles from the individual spots on the sample surface through a common cross-over of the backscattered charged particles to substantially individual spots on the position sensitive backscatter charged particle detector.

9. Apparatus according to claim 8, wherein an aperture is arranged in or near the plane comprising the common cross-over of the backscattered charged particles.

10. Apparatus according to claim 9, wherein said aperture comprises open areas to allow passage of certain angular directions of the backscattered charged particles, while blocking other angular directions.

11. Apparatus according to claim 1, wherein the position sensitive backscatter charged particle detector contains more than one pixel per backscatter charged particle beam.

12. Apparatus according to claim 1, wherein the position sensitive backscatter charged particle detector is a CCD camera, a CMOS camera, an array of avalanche photo diodes, photo multipliers or PN junction semiconductor detector which gets signal from backscatter charged particles directly.

13. Apparatus according to claim 1, wherein the position sensitive backscatter charged particle detector comprises a fluorescent screen arranged at least substantially in or near said intermediate plane and an optical arrangement for conveying photons from the fluorescent screen to a CCD camera, a CMOS camera, an array of avalanche photo diodes or photo multipliers.

14. Apparatus according to claim 13, wherein the CCD camera, CMOS camera, array of avalanche photo diodes or photo multipliers is positioned such that the array of detector pixels coincides with the array of images of the individual backscatter beams.

15. Apparatus according to claim 1, wherein the second lens system is arranged for imaging the first array of separated spots from said intermediate plane onto the sample surface with a magnification in a range from 0.01 to 0.2.

16. Apparatus according to claim 1, wherein the pitch between the spots in the second array of separated spots on the sample surface is between 0.3 and 30 micrometers.

17. Apparatus according to claim 1, wherein the second lens system is arranged for projecting the primary charged particle beams through a common cross-over, and wherein the apparatus comprises a position sensitive secondary electron detector positioned at least substantially in or near a plane comprising said common cross-over.

18. Apparatus according to claim 1, wherein the second lens system comprises magnetic and/or electrostatic charged particle deflectors for scanning the primary charged particle over the sample.

19. Apparatus according to claim 18, wherein the magnetic and/or electrostatic charged particle deflectors are arranged and/or controllable for obtaining a substantially stationary positioning of the array of backscattered charged particle spots on the detector during scanning.

20. Method for inspecting a surface of a sample comprising the steps of:

generating an array of primary charged particle beams using a multi beam charged particle generator;

focusing the primary charged particle beams into a first array of separated spots in an intermediate plane, using a first lens system;

directing the primary charged particle beams from the intermediate plane towards the sample surface using a second lens system and focusing all primary charged particle beams into a second array of individual spots on the sample surface using an electromagnetic or electrostatic objective lens which is common for at least the primary charged particle beams;

projecting backscattered charged particles from the second array of individual spots on the sample surface into an array of backscattered charged particle spots on the intermediate plane using said second lens system; and

detecting said backscattered charged particles using a position sensitive backscatter charged particle detector positioned in or near the intermediate plane, wherein said detector comprises one or more through openings for passing said primary charged particle beams there through.

21. Method according to claim 20, wherein the second lens system comprises one or more magnetic lenses which are arranged to rotate the array of primary charged particle beams around the optical axis on their way from said intermediate plane towards the sample, and to position the second array with respect to the first array at an angle larger than 0 degrees and preferably smaller than 180 degrees around the optical axis.

22. Method according to claim 21, wherein the one or more magnetic lenses are arranged to rotate the array of backscattered charged particle spots with respect to the first array at an angle larger than 0 degrees and preferably smaller than 360 degrees around the optical axis.

23. Method according to claim 22, wherein the one or more magnetic lenses are arranged to rotate the array of backscattered charged particle spots with respect to the first array at an angle of substantially 180 degrees around the optical axis.

24. Method according to claim 23, wherein the detector comprises one through opening for passing said primary charged particle beams there through.

25. Method according to claim 20 any one of the claims 20, wherein the second lens system comprises magnetic and/or electrostatic charged particle deflectors to scan the primary charged particle over the sample.

26. Method according to claim 25, wherein the magnetic and/or electrostatic charged particle deflectors are arranged and/or controllable to obtain a substantially stationary positioning of the array of backscattered charged particle spots on the detector during scanning.

27. Method according to claim 25, in which the sample surface is moved at constant speed in a first direction while the primary charged particle beams are scanned repeatedly in a second direction at least substantially perpendicular to the first direction.