SHALLOW TRENCH ISOLATION FOR END FIN VARIATION CONTROL
First Claim
1. A fin field effect transistor (FinFET) device, comprising:
- a plurality of fins;
a plurality of shallow trench isolation (STI) regions, each adjacent pair of the plurality of fins being separated by one of the plurality of STI regions;
a deep STI region formed on a first side of an end fin among the plurality of fins; and
gate material deposited over the plurality of fins and in the deep STI region, the gate material covering both sides of a fin reveal of each of the plurality of fins and covering the first side of the end fin by filling a gap between the first side of the end fin and a gate oxide layer in the deep STI region.
2 Assignments
0 Petitions
Accused Products
Abstract
A method of fabricating a fin field effect transistor (FinFET) device and the device are described. The method includes forming a deep STI region adjacent to a first side of an end fin among a plurality of fins and lining the deep STI region, including the first side of the end fin, with a passivation layer. The method also includes depositing an STI oxide into the deep STI region, the passivation layer separating the STI oxide and the first side of the end fin, etching back the passivation layer separating the STI oxide and the first side of the end fin to a specified depth to create a gap, and depositing gate material, the gate material covering the gap.
-
Citations
10 Claims
-
1. A fin field effect transistor (FinFET) device, comprising:
-
a plurality of fins; a plurality of shallow trench isolation (STI) regions, each adjacent pair of the plurality of fins being separated by one of the plurality of STI regions; a deep STI region formed on a first side of an end fin among the plurality of fins; and gate material deposited over the plurality of fins and in the deep STI region, the gate material covering both sides of a fin reveal of each of the plurality of fins and covering the first side of the end fin by filling a gap between the first side of the end fin and a gate oxide layer in the deep STI region. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
-
Specification