×

DRY CLEANING METHOD AND PLASMA PROCESSING APPARATUS

  • US 20150311045A1
  • Filed: 04/21/2015
  • Published: 10/29/2015
  • Est. Priority Date: 04/28/2014
  • Status: Abandoned Application
First Claim
Patent Images

1. A dry cleaning method implemented by a plasma processing apparatus that includes a processing chamber including a member containing chromium, a mounting table arranged within the processing chamber and configured to hold a substrate, and a gas supply source configured to supply gas into the processing chamber, the dry cleaning method comprising:

  • a first process step of supplying a first cleaning gas containing oxygen into the processing chamber, supplying a high frequency power or a microwave power into the processing chamber, and generating a plasma from the first cleaning gas; and

    a second process step of supplying a second cleaning gas containing bromine into the processing chamber after the first process step.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×