PIXEL STRUCTURE FOR ACTIVE MATRIX DISPLAY, AND METHOD FOR MANUFACTURING SAME

• US 20150311267A1
• Filed: 12/02/2013
• Published: 10/29/2015
• Est. Priority Date: 12/07/2012
• Status: Abandoned Application

• Current Assignee: Heraeus Deutschland GmbH & Co. KG (Heraeus Holding GMBH)
• Original Assignee: Heraeus Precious Metals GmbH & Co. KG (Einhorn Verwaltungsgesellschaft mbH), Korea Electronics Technology Institute (Government of South Korea)
• Inventors: KIM, YongHoon, HAN, ChulJong, LEE, Jeongno, YOO, Byungwook
• Application Number:
  US14/650,141
• Publication Number:
  US 20150311267A1
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: H10K 2102/341 Short-circuit prevention
• CPC Class Codes: H10K 50/81 Anodes
• CPC Class Codes: H10K 59/1201 Manufacture or treatment
• CPC Class Codes: H10K 59/122 Pixel-defining structures or layers, e.g. banks
• CPC Class Codes: H10K 59/124 Insulating layers formed between TFT elements and OLED elements
• CPC Class Codes: H10K 59/8051 Anodes
• CPC Class Codes: H10K 71/00 Manufacture or treatment specially adapted for the organic devices covered by this subclass
• CPC Class Codes: H10K 71/621 Providing a shape to conductive layers, e.g. patterning or selective deposition
• CPC Class Codes: H10K 85/1135 Polyethylene dioxythiophene [PEDOT]; Derivatives thereof

Abstract

The present invention relates to a pixel structure for an active matrix display and to a method for manufacturing same, and the objective thereof is to simplify processes for manufacturing pixel electrodes and pixel defining layers and address a problem caused by a terminal which is formed at an edge part of the pixel electrode through the patterning of the pixel electrode. The pixel structure according to the present invention includes: a base substrate; a plurality of pixel circuit electrodes; an insulating layer; and a composite layer. The plurality of pixel circuit electrodes is arranged in a matrix form on the base substrate. The insulating layer is formed on the base substrate to cover the outer peripheries of the plurality of pixel circuit electrodes. The composite layer is integrally formed to cover the plurality of pixel circuit electrodes and the top of the insulating layer. In this case, the composite layer has: the conductive pixel electrodes that are formed to be respectively connected to the plurality of pixel circuit electrodes which are exposed from the insulating layer; and the non-conductive pixel defining layers on the outer peripheries of the pixel electrodes.

Claims

1. A pixel structure of an active matrix display, comprising:

a base substrate;

a plurality of pixel circuit electrodes arranged in the form of a matrix on the base substrate;

an insulating layer formed on the base substrate to cover edges of the plurality of pixel circuit electrodes; and

a composite layer integrally formed to cover the plurality of pixel circuit electrodes and the insulating layer, wherein the composite layer includes conductive pixel electrodes respectively connected to the plurality of pixel circuit electrodes exposed in the insulating layer, and a non-conductive pixel-defining layer disposed around the pixel electrodes.

2. The pixel structure of an active matrix display of claim 1, wherein the composite layer is formed based on conductive polyethylene dioxythiophene/polystyrene sulfonate (PEDT/PSS) or poly(3,4-ethylenedioxythiophene)/polystyrene sulfonate (PEDOT/PSS), the pixel-defining layer is formed by changing the characteristic of electrical resistance of the conductive PEDT/PSS or PEDOT/PSS, and the pixel electrodes are formed of the remaining conductive PEDT/PSS or PEDOT/PSS.

3. The pixel structure of an active matrix display of claim 2, wherein the pixel electrodes and the pixel-defining layer are formed to be coplanar.

4. A method of forming a pixel structure of an active matrix display, comprising:

providing a base substrate including a plurality of pixel circuit electrodes and an insulating layer formed on an upper surface thereof; and

forming an integrated composite layer to cover the plurality of pixel circuit electrodes and the insulating layer, wherein the composite layer includes conductive pixel electrodes respectively connected to the plurality of pixel circuit electrodes exposed by the insulating layer, and a non-conductive pixel-defining layer disposed around the pixel electrodes.

5. The method of claim 4, wherein the forming of the composite layer comprises;

forming a conductive polymer layer configured to cover the plurality of pixel circuit electrodes and the insulating layer;

forming a photoresist film on the conductive polymer layer;

forming an opening by removing the photoresist film on a portion to be the pixel-defining layer in the conductive polymer layer;

forming the non-conductive pixel-defining layer by changing the characteristic of electrical resistance of the portion of the conductive polymer layer exposed by the opening; and

removing the photoresist film.

6. The method of claim 5, wherein when forming the non-conductive pixel-defining layer, portions covered by the photoresist film in the conductive polymer layer are defined as the pixel electrodes by the pixel-defining layer.

7. The method of claim 5, wherein the composite layer is formed based on conductive polyethylene dioxythiophene/polystyrene sulfonate (PEDT/PSS) or poly(3,4-ethylenedioxythiophene)/polystyrene sulfonate (PEDOT/PSS), the pixel-defining layer is formed by changing the characteristic of electrical resistance of the conductive PEDT/PSS or PEDOT/PSS, and the pixel electrodes are formed of the remaining conductive PEDT/PSS or PEDOT/PSS.

8. The method of claim 4, wherein the pixel electrodes and the pixel-defining layer are formed to be coplanar.