METHOD FOR PRODUCTION OF OPTICAL WAVEGUIDES AND COUPLING AND DEVICES MADE FROM THE SAME

• US 20150323737A1
• Filed: 04/09/2015
• Published: 11/12/2015
• Est. Priority Date: 05/08/2014
• Status: Active Grant

• Current Assignee: Partow Technologies, LLC.
• Original Assignee: Payam Rabiei
• Inventors: Rabiei, Payam
• Granted Patent: US 9,229,158 B2
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: B82Y 20/00 Nanooptics, e.g. quantum optics or photonic crystals
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: C23C 14/34 Sputtering
• CPC Class Codes: G02B 2006/1204 Lithium niobate (LiNbO3)
• CPC Class Codes: G02B 2006/12045 Lithium tantalate (LiTaO3)
• CPC Class Codes: G02B 2006/12054 Tantalum pentoxide (Ta2O5)
• CPC Class Codes: G02B 2006/12057 Niobium pentoxide (Nb2O5)
• CPC Class Codes: G02B 2006/12097 Ridge, rib or the like
• CPC Class Codes: G02B 2207/101 Nanooptics
• CPC Class Codes: G02B 6/02295 Microstructured optical fibre polarisation properties thereof G02B6/105 and G02B6/024
• CPC Class Codes: G02B 6/03677 arranged - + + -
• CPC Class Codes: G02B 6/107 Subwavelength-diameter waveguides, e.g. nanowires
• CPC Class Codes: G02B 6/12033 characterised by means for configuring the device, e.g. moveable element for wavelength tuning switching G02B6/35; thermo-optic devices G02F1/0147
• CPC Class Codes: G02B 6/1223 high refractive index type, i.e. high-contrast waveguides
• CPC Class Codes: G02B 6/136 by etching
• CPC Class Codes: G02F 1/035 in an optical waveguide structure
• CPC Class Codes: G02F 1/225 in an optical waveguide structure
• CPC Class Codes: G02F 1/3558 Poled materials, e.g. with periodic poling; Fabrication of domain inverted structures, e.g. for quasi-phase-matching [QPM]
• CPC Class Codes: G02F 2201/30 grating
• CPC Class Codes: G02F 2202/20 LiNbO3, LiTaO3
• CPC Class Codes: H01J 37/32366 : Localised processing

Abstract

Novel processing methods for production of high-refractive index contrast and low loss optical waveguides are disclosed. In one embodiment, a novel waveguide is produced by first depositing or growing a first low refractive index material layer as a cladding layer on top of a base substrate. Then, a first high refractive index material layer is deposited or transferred to the top of the cladding layer to form a slab core region. Subsequently, a second high refractive index material layer is deposited on top of the slab core region, and an etch mask layer is formed. Furthermore, the second high refractive index material layer is selectively etched by utilizing a dry-etching tool with high selectivity to the etch mask layer, and a second low refractive index material layer is deposited as a top cladding layer to encapsulate the second high refractive index material layer on top of lower cladding layers.

Claims

1. A method for producing a high-refractive index contrast and low loss optical waveguide, the method comprising the steps of:

depositing or growing a first low refractive index material layer as a cladding layer on top of a silicon base substrate;

depositing or transferring a first high refractive index material layer on top of the first low refractive index material layer to form a slab core region;

depositing a second high refractive index material layer on top of the slab core region;

forming an etch mask layer on the second high refractive index material layer;

selectively etching the second high refractive index material layer by utilizing a dry-etching tool with high selectivity to the etch mask layer; and

depositing a second low refractive index material layer as a top cladding layer to encapsulate the second high refractive index material layer on top of lower cladding layers.

2. The method for producing the high-refractive index contrast and low loss optical waveguide of claim 1, wherein the first low refractive index material layer and the second low refractive index material layer are each made of silicon dioxide, and wherein the first high refractive index material layer is made of lithium niobate and lithium tantalate, with a refractive index approximately between 2 and 2.3 to match the second high refractive index material layer'"'"'s refractive index.

3. The method for producing the high-refractive index contrast and low loss optical waveguide of claim 2, wherein the step of depositing the first high refractive index material layer utilizes an ion slicing technique, if the lithium niobate or the lithium tantalite forms the first high refractive index material layer.

4. The method for producing the high-refractive index contrast and low loss optical waveguide of claim 2, wherein the step of depositing the second high refractive index material layer utilizes sputtering or evaporation to form the second high refractive index material layer.

5. The method for producing the high-refractive index contrast and low loss optical waveguide of claim 1, wherein the slab core region has a thickness approximately between 100 nm and 2000 nm.

6. The method for producing the high-refractive index contrast and low loss optical waveguide of claim 1, wherein the second high refractive index material layer is made of tantalum oxide, niobium oxide, titanium oxide, lanthanum oxide, another metal oxide, or a high index composite made thereof, with an approximate thickness between 50 nm and 1000 nm and approximate refractive index around 2.2 or higher.

7. The method for producing the high-refractive index contrast and low loss optical waveguide of claim 1, wherein the second low refractive index material layer as the top cladding layer is based on silicon dioxide or polymers with a refractive index of approximately 1.5.