PARTICLE REMOVAL SYSTEM AND METHOD THEREOF

• US 20150323862A1
• Filed: 05/12/2014
• Published: 11/12/2015
• Est. Priority Date: 05/12/2014
• Status: Active Grant

• Current Assignee: Taiwan Semiconductor Manufacturing Company Limited
• Original Assignee: Taiwan Semiconductor Manufacturing Company Limited
• Inventors: Chang, Shu-Hao, Lu, Chi-Lun, Chien, Shang-Chieh, Chien, Ming-Chin, Wu, Jui-Ching, Chen, Jeng-Horng, Chen, Chia-Chen, Cheng, Chieh-Jen
• Granted Patent: US 10,067,418 B2
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: B08B 7/0021 by liquid gases or supercritical fluids
• CPC Class Codes: G03F 1/82 Auxiliary processes, e.g. cleaning or inspecting

Abstract

A method of removing particles from a surface of a reticle is disclosed. The reticle is placed in a carrier, a source gas is flowed into the carrier, and a plasma is generated within the carrier. Particles are then removed from a surface of the reticle using the generated plasma. A system of removing particles from a surface includes a carrier configured to house a reticle, a reticle stocker including the carrier, a power supply configured to apply a potential between an inner cover and an inner baseplate of the carrier, and a gas source configured to flow a gas into the carrier. A plasma may be generated within the carrier, and particles can be removed from a surface of the reticle using the generated plasma. An acoustic energy source configured to agitate at least one of the source gas and the generated plasma may be provided to facilitate particle removal using an agitated plasma.

Claims

1. A method of removing particles from a surface of a reticle, comprising:

placing the reticle in a carrier;

flowing a source gas into the carrier;

generating a plasma within the carrier using the source gas; and

removing particles from a surface of the reticle using the generated plasma.

2. The method of claim 1, wherein the source gas includes one of molecular hydrogen and water vapor.

3. The method of claim 2, wherein the source gas is mixed with at least one inert gas including one selected from a group comprising:

helium;

neon;

argon;

krypton;

xenon; and

radon.

4. The method of claim 3, wherein a source gas-inert gas mixture includes a hydrogen concentration of less than about 3 percent.

5. The method of claim 2, wherein the removing further includes removing particles from the surface using a hydrogen radical.

6. The method of claim 1, further including prior to generating the plasma, applying a voltage to the carrier.

7. A system for removing particles from a surface of a reticle, comprising:

a carrier configured to house the reticle;

a reticle stocker including the carrier;

a power supply configured to apply a potential between an inner cover and an inner baseplate of the carrier; and

a gas source configured to flow a gas into the carrier;

wherein a plasma is generated within the carrier using the gas and the applied potential; and

wherein particles are removed from a surface of the reticle using the generated plasma.

8. The system of claim 7, wherein the carrier is a dual pod carrier including an inner pod.

9. The system of claim 8, wherein the inner pod includes the inner cover and the inner baseplate.

10. The system of claim 9, wherein the plasma is generated within the inner pod.

11. The system of claim 7, wherein the power supply includes one of a direct current (DC) power supply and a radio frequency (RF) power supply.

12. The system of claim 7, wherein the gas includes one of molecular hydrogen and water vapor.

13. The system of claim 12, wherein the gas source is configured to flow a gas-inert gas mixture, and wherein the inert gas includes at least one selected from a group comprising:

helium;

neon;

argon;

krypton;

xenon; and

radon.

14. The system of claim 13, wherein the gas-inert gas mixture includes a hydrogen concentration of less than about 3 percent.

15. A method of removing particles from a surface, comprising:

generating a plasma using a source gas;

providing an acoustic energy source configured to agitate at least one of the source gas and the generated plasma; and

removing particles from the surface using an agitated plasma.

16. The method of claim 15, wherein prior to generating the plasma, agitating the source gas using the acoustic energy source.

17. The method of claim 15, further including agitating the generated plasma using the acoustic energy source.

18. The method of claim 15, wherein the source gas includes one of molecular hydrogen and water vapor.

19. The method of claim 18, wherein the source gas is mixed with at least one inert gas including one selected from a group comprising:

helium;

neon;

argon;

krypton;

xenon; and

radon.

20. The method of claim 15, wherein the surface includes one of an EUV reticle surface and an EUV optics component surface.