MASS-LOADED CORIOLIS VIBRATORY GYROSCOPE

• US 20150330782A1
• Filed: 10/06/2014
• Published: 11/19/2015
• Est. Priority Date: 05/16/2014
• Status: Abandoned Application

• Current Assignee: Honeywell International Inc.
• Original Assignee: Honeywell International Inc.
• Inventors: Johnson, Burgess R., Chang, Steve, Moore, Sean, Reinke, John
• Application Number:
  US14/507,546
• Publication Number:
  US 20150330782A1
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: G01C 19/56 Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
• CPC Class Codes: G01C 19/5712 the devices involving a micromechanical structure

Abstract

A mass-loaded resonator for use in a vibratory sensor is disclosed. In at least one embodiment, the mass-loaded resonator includes a common base having a top face, a bottom face and a plurality of sides. Furthermore, a plurality of flexures are attached to the common base and project substantially perpendicular from the normal of the top face of the common base when the mass-loaded resonator is at rest. Moreover, the plurality of flexures have a thickness that is substantially less than the thickness of the common base.

Claims

1. A mass-loaded resonator for use in a vibratory sensor:

a common base having a top face, a bottom face and a plurality of sides; and

a plurality of flexures attached to the common base and projecting substantially perpendicular from the normal of the top face of the common base when the mass-loaded resonator is at rest, wherein the plurality of flexures have a thickness that is substantially less than the thickness of the common base.

2. The mass-loaded resonator of claim 1, wherein the common base and the plurality of flexures are patterned from a single piece of material.

3. The mass-loaded resonator of claim 1, wherein the plurality of flexures are attached to a top plate and wherein the top plate is attached to the common base.

4. The mass-loaded resonator of claim 3, wherein the plurality of flexures and the top plate are patterned from a single piece of material.

5. The mass-loaded resonator of claim 1, further comprising a plurality of electrodes attached to the common base, wherein the plurality of flexures are configured to excite the mass-loaded resonator into two degenerate modes when at least one electric field is applied to the plurality of electrodes.

6. The mass-loaded resonator of claim 1, wherein the plurality of flexures are comprised of a material having a low mechanical loss.

7. The mass-loaded resonator of claim 1, wherein the mass-loaded resonator has a resonant frequency that is greater than 2 kilohertz.

8. The mass-loaded resonator of claim 1, wherein the plurality of flexures are substantially comprised of one or more of the following materials:

diamond, single crystal silicon, fused silica, silicon or ultra-low expansion glass.

9. The mass-loaded resonator of claim 1, wherein the common base is substantially comprised of one or more of the following materials:

diamond, single crystal silicon, fused silica, silicon or ultra-low expansion glass.

10. A method for constructing a mass-loaded resonator comprising:

patterning a plurality of flexures in a material using a first etch method; and

releasing the plurality of flexures according to the pattern using a second etch method;

patterning a common base using a third etch method, wherein the common base has a top face, a bottom face and a plurality of sides and wherein the common base has a thickness that is substantially greater than the thickness of the plurality of flexures and wherein the plurality of flexures are attached to the common base and project substantially perpendicular from the normal of the top face of the common base when the mass-loaded resonator is at rest; and

releasing the common base according to the pattern using a fourth etch method.

11. The method of claim 10, wherein the plurality of flexures and the common base are patterned from a single piece of material.

12. The method of claim 10, further comprising:

patterning a top plate, wherein the plurality of flexures are attached to the top plate and wherein the plurality of flexures and the top plate are patterned from a single piece of material; and

attaching the top plate to the common base.

13. The method of claim 12, wherein attaching the top plate to the common base comprises either depositing the flexure material and the top plate material on to one side of the resonator or bonding the top plate to the resonator.

14. The method of claim 10, wherein the first etch method and the second etch method are the same etch methods.

15. The method of claim 10, wherein the third etch method and the fourth etch method are the same etch methods.

16. The method of claim 10, wherein the first etch method, the second etch method, the third etch method and the fourth etch method is one of the following etch methods:

reactive ion etching, deep reactive ion etching, plasma etching, sputter etching, vapor phase etching, aqueous potassium hydroxide etching, hydrogen fluoride etching, or buffered oxide etching.

17. The method of claim 10, wherein the mass-loaded resonator has a resonant frequency that is greater than 2 kilohertz.

18. A mass-loaded resonator gyroscope, comprising:

a support plate;

a mass-loaded resonator including;

a common base having a top face, a bottom face and a plurality of sides; and

a plurality of flexures attached to the common base and projecting substantially perpendicular from the normal of the top face of the common base when the mass-loaded resonator is at rest, wherein the plurality of flexures have a thickness that is substantially less than the thickness of the common base; and

a plurality of electrodes attached to the mass-loaded resonator, wherein the plurality of flexures are configured to excite the mass-loaded resonator into two degenerate modes when at least one electric field is applied to the plurality of electrodes.

19. The mass-loaded resonator gyroscope of claim 18, wherein the common base and the plurality of flexures are patterned from a single piece of material.

20. The mass-loaded resonator gyroscope of claim 18, wherein the plurality of flexures are attached to a top plate, wherein the top plate is attached to the common base, and wherein the plurality of flexures and the top plate are patterned from a single piece of material.