RESIST UNDERLAYER FILM-FORMING COMPOSITION

• US 20150337164A1
• Filed: 12/17/2013
• Published: 11/26/2015
• Est. Priority Date: 01/09/2013
• Status: Active Grant

• Current Assignee: Nissan Chemical Industries Limited (Shin-Etsu Chemical Company Limited)
• Original Assignee: Nissan Chemical Industries Limited (Shin-Etsu Chemical Company Limited)
• Inventors: OHASHI, Tomoya, KIMURA, Shigeo, OGATA, Hiroto
• Granted Patent: US 9,534,140 B2
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: C08G 63/065 the hydroxy and carboxylic ester groups being bound to aromatic rings
• CPC Class Codes: C08J 2367/04 Polyesters derived from hydroxy carboxylic acids, e.g. lactones C08J2367/06 takes precedence
• CPC Class Codes: C08J 3/095 Oxygen containing compounds
• CPC Class Codes: C08K 5/0008 Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
• CPC Class Codes: C09D 167/04 Polyesters derived from hydroxycarboxylic acids, e.g. lactones C09D167/06 takes precedence
• CPC Class Codes: G03F 7/091 characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
• CPC Class Codes: G03F 7/094 Multilayer resist systems, e.g. planarising layers
• CPC Class Codes: G03F 7/11 having cover layers or intermediate layers, e.g. subbing layers G03F7/091 - G03F7/093, B41N3/03 take precedence

Abstract

There is provided a resist underlayer film-forming composition having excellent solubility in a solvent containing propylene glycol monomethyl ether as a main component. A resist underlayer film-forming composition comprising a polymer having a structural unit of Formula (1a) or Formula (1c) and a structural unit of Formula (1b) and a solvent containing more than 50% by mass of propylene glycol monomethyl ether, wherein in the polymer, the structural unit of Formula (1a) or Formula (1c) and the structural unit of Formula (1b) are arranged alternately.

(In Formulae (1a) and (1b), Q is a phenylene group or a naphthylene group, m is 1 or 2, and each of n is independently 0 or 1.)

Claims

1. A resist underlayer film-forming composition comprising a polymer having a structural unit of Formula (1a) or Formula (1c) and a structural unit of Formula (1b) and a solvent containing more than 50% by mass of propylene glycol monomethyl ether, wherein in the polymer, the structural unit of Formula (1a) or Formula (1c) and the structural unit of Formula (1b) are arranged alternately.

2. The resist underlayer film-forming composition according to claim 1, wherein the polymer has a structural unit of Formula (1a′

) as the structural unit of Formula (1a), a structural unit of Formula (1b′

) and a structural unit of Formula (1b″

) as the structural unit of Formula (1b), and in the polymer, the structural unit of Formula (1a′

) and the structural unit of Formula (1b′

), and the structural unit of Formula (1a′

) and the structural unit of Formula (1b″

) are arranged alternately.

3. The resist underlayer film-forming composition according to claim 1, wherein when the content of propylene glycol monomethyl ether in the solvent is less than 100% by mass, a residual component of the solvent is a solvent miscible in propylene glycol monomethyl ether without layer separation.

4. The resist underlayer film-forming composition according to claim 1, wherein the resist underlayer film-forming composition further comprises a crosslinkable compound.

5. The resist underlayer film-forming composition according to claim 4, further comprising a crosslinking catalyst.

6. The resist underlayer film-forming composition according to claim 1, further comprising a surfactant.