MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD

• US 20150346611A1
• Filed: 05/21/2015
• Published: 12/03/2015
• Est. Priority Date: 05/27/2014
• Status: Active Grant

• Current Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Original Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Inventors: Noda, Kenji
• Granted Patent: US 9,651,876 B2
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: G01B 11/002 for measuring two or more coordinates
• CPC Class Codes: G03F 7/70725 control
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position

Abstract

A measurement apparatus includes: an imaging unit positioned with fixing with respect to a first member; a first detector configured to detect a position of a stage with reference to a second member; a second detector configured to detect fluctuation of a position of the first member with reference to the second member; and a control unit configured to obtain the position of the mark from an image of the mark sensed by the imaging unit while controlling a relative position of the stage relative to the second member so as to reduce fluctuation of a relative position of the mark relative to the imaging unit due to the fluctuation of the position of the first member based on detection results of the first and second detectors.

Claims

1. A measurement apparatus for measuring a position of a mark on a stage, the apparatus comprising:

an imaging unit positioned with fixing with respect to a first member and configured to sense an image of the mark;

a first detector configured to detect a position of said stage with reference to a second member;

a second detector configured to detect fluctuation of a position of said first member with reference to said second member; and

a control unit configured to obtain the position of the mark from an image of the mark sensed by said imaging unit while controlling a relative position of said stage relative to said second member so as to reduce fluctuation of a relative position of the mark relative to said imaging unit due to the fluctuation of the position of said first member based on a detection result of said first detector and a detection result of said second detector.

2. The apparatus according to claim 1, wherein

said control unit corrects data on the position of said stage detected by said first detector by using the detection result of said second detector, and senses the image of the mark by said imaging unit while controlling the position of said stage based on the corrected data.

3. The apparatus according to claim 2, wherein

said stage is positionable with respect to six axes, and said control unit corrects the data on the position of said stage detected by said first detector with respect to at least one of the six axes.

4. The apparatus according to claim 1, wherein

said control unit corrects a target position of said stage by using the detection result of said first detector and the detection result of said second detector, and senses the image of the mark by said imaging unit while controlling the position of said stage to be the corrected target position.

5. The apparatus according to claim 4, wherein

said stage is positionable with respect to six axes, and said control unit corrects the target position of said stage with respect to at least one of the six axes.

6. The measurement apparatus according to claim 1, wherein

said first member supports said stage.

7. The apparatus according to claim 1, wherein

the mark is formed on an object placed on said stage.

8. The apparatus according to claim 1, wherein

said second detector is held by said first member or said second member.

9. The apparatus according to claim 1, wherein

each of said first detector and said second detector includes a displacement meter.

10. The apparatus according to claim 9, wherein

said first detector includes an interferometer.

11. A lithography apparatus for forming a pattern on a substrate, the apparatus comprising:

an original stage configured to hold an original;

a substrate stage configured to hold said substrate;

a first member;

a second member; and

a measurement apparatus for measuring a position of a mark on at least one stage of said original stage and said substrate stage,

wherein said measurement apparatus includes;

an imaging unit positioned with fixing with respect to said first member and configured to sense an image of the mark;

a first detector configured to detect a position of said stage with reference to said second member;

a second detector configured to detect fluctuation of a position of said first member with reference to said second member; and

a control unit configured to obtain the position of the mark from an image of the mark sensed by said imaging unit while controlling a relative position of said stage relative to said second member so as to reduce fluctuation of a relative position of the mark relative to said imaging unit due to the fluctuation of the position of said first member based on a detection result of said first detector and a detection result of said second detector.

12. The lithography apparatus according to claim 11, wherein

said apparatus includes an exposure apparatus for projecting a pattern of said original to said substrate via a projection optical system to form a pattern on said substrate.

13. The apparatus according to claim 12, wherein

said second member includes a support of an optical system barrel for holding said projection optical system.

14. The apparatus according to claim 11, wherein

said apparatus includes an imprint apparatus for forming a pattern on said substrate by bringing said original into contact with said substrate.

15. The apparatus according to claim 11, wherein

said first member and said second member are separated from each other.

16. The apparatus according to claim 11, wherein

said second member is supported through a vibration isolator.

17. The apparatus according to claim 11, wherein

said stage is supported by said first member.

18. A method of manufacturing an article, the method comprising:

forming a pattern on a substrate by using a lithography apparatus; and

processing said substrate on which the pattern has been formed to manufacture the article,

wherein said lithography apparatus includes;

an original stage configured to hold an original;

a substrate stage configured to hold said substrate;

a first member;

a second member; and

a measurement apparatus for measuring a position of a mark on at least one stage of said original stage and said substrate stage,

wherein said measurement apparatus includes;

an imaging unit positioned with fixing with respect to said first member and configured to sense an image of the mark;

a first detector configured to detect a position of said stage with reference to said second member;

a second detector configure to detect fluctuation of a position of said first member with reference to said second member; and

a control unit configured to obtain the position of the mark from an image of the mark sensed by said imaging unit while controlling a relative position of said stage relative to said second member so as to reduce fluctuation of a relative position of the mark relative to said imaging unit due to the fluctuation of the position of said first member based on a detection result of said first detector and a detection result of said second detector.