Ultrathin Multilayer Metal Alloy Liner for Nano Cu Interconnects
First Claim
1. A process comprising:
- (a) forming wire embedded in a dielectric layer on a semiconductor substrate, said wire comprising a copper core comprising sidewalls and a bottom of said copper core, a top surface of said wire coplanar with a top surface of said dielectric layer;
(b) forming an electrically conductive alloy liner on said sidewalls based on Mn, with at least one of Co and/or W to minimize or eliminate EM and/or TDDB;
(c) without exposing said substrate to oxygen, forming a dielectric liner over said alloy liner, any exposed portions of said alloy liner, and said dielectric layer.
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Accused Products
Abstract
Compositions of matter, compounds, articles of manufacture and processes to reduce or substantially eliminate EM and/or stress migration, and/or TDDB in copper interconnects in microelectronic devices and circuits, especially a metal liner around copper interconnects comprise an ultra thin layer or layers of Mn alloys containing at least one of W and/or Co on the metal liner. This novel alloy provides EM and/or stress migration resistance, and/or TDDB resistance in these copper interconnects, comparable to thicker layers of other alloys found in substantially larger circuits and allows the miniaturization of the circuit without having to use thicker EM and/or TDDB resistant alloys previously used thereby enhancing the miniaturization, i.e., these novel alloy layers can be miniaturized along with the circuit and provide substantially the same EM and/or TDDB resistance as thicker layers of different alloy materials previously used that lose some of their EM and/or TDDB resistance when used as thinner layers.
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Citations
20 Claims
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1. A process comprising:
- (a) forming wire embedded in a dielectric layer on a semiconductor substrate, said wire comprising a copper core comprising sidewalls and a bottom of said copper core, a top surface of said wire coplanar with a top surface of said dielectric layer;
(b) forming an electrically conductive alloy liner on said sidewalls based on Mn, with at least one of Co and/or W to minimize or eliminate EM and/or TDDB;
(c) without exposing said substrate to oxygen, forming a dielectric liner over said alloy liner, any exposed portions of said alloy liner, and said dielectric layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 15, 18, 19)
- (a) forming wire embedded in a dielectric layer on a semiconductor substrate, said wire comprising a copper core comprising sidewalls and a bottom of said copper core, a top surface of said wire coplanar with a top surface of said dielectric layer;
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9. A structure, comprising:
- a wire embedded in a dielectric layer on a semiconductor substrate, said wire comprising a copper core and an electrically conductive metal alloy liner on sidewalls and a bottom of said copper core, said copper core and said electrically conductive metal alloy liner exposed at a top surface of said dielectric layer;
core;
a dielectric cap over said metal cap, on any exposed portions of said metal alloy liner, and on said dielectric layer; and
wherein said liner comprises an alloy of Mn, with at lest one of Co and/or W - View Dependent Claims (10, 11, 12, 13, 14, 20)
- a wire embedded in a dielectric layer on a semiconductor substrate, said wire comprising a copper core and an electrically conductive metal alloy liner on sidewalls and a bottom of said copper core, said copper core and said electrically conductive metal alloy liner exposed at a top surface of said dielectric layer;
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16. A deposition tool comprising:
- a load/unload chamber;
a mechanism for transferring a substrate between said load/unload chamber and a deposition chamber, said deposition chamber connected to said load/unload chamber by a port;and wherein said deposition chamber is (i) configured to selectively form a metal layer or layers on copper by chemical vapor deposition or by atomic layer deposition and (ii) is configured to form a dielectric layer by chemical vapor deposition, and additionally comprising further downstream chambers selected from at least one of a UV and a Low rf stream plasma or thermal cure means in at least one of a reducing environment ambient to enhance the reaction/intermixing between said layer or layers and said copper. - View Dependent Claims (17)
- a load/unload chamber;
Specification