Scalable CVD Film and Nanomaterial Synthesis

• US 20150361549A1
• Filed: 06/09/2015
• Published: 12/17/2015
• Est. Priority Date: 06/13/2014
• Status: Active Grant

• Current Assignee: CVD Equipment Corporation
• Original Assignee: CVD Equipment Corporation
• Inventors: Strobl, Karlheinz
• Granted Patent: US 9,738,973 B2
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: C23C 16/458 characterised by the method used for supporting substrates in the reaction chamber
• CPC Class Codes: Y10T 428/24777 Edge feature

Abstract

The present invention relates to tools and system designs for chemical vapor deposition (CVD) systems and CVD synthesis used to deposit one or more thin film layers onto a flexible substrate or to grow nano-structured materials on large area flexible substrates and, more particularly, to scalable CVD coating and nanostructure manufacturing including CVD thin films and nano-structured materials such as nanotubes, nanowires and nanosheets.

Claims

1. A method for large area production of CVD-processed materials, the method comprising the steps of:

a) positioning a first remounted substrate roll into the primary reaction chamber of a batch process chemical vapor deposition synthesis system, said roll being formed of i) an extended first substrate having a width W, a length L and a thickness T, wherein T<

<

W<

<

L, and ii) at least two outer spacer strips, and wherein said first substrate is wound in its length direction in such a manner that said outer spacer strips are inserted between each consecutive layer of said roll and located near the edges of said width of said substrate;

b) processing said roll via chemical vapor deposition, said outer spacer strips being formed of a material which is substantially open thus permitting substantially uninhibited process gas exchange between the internal and external volume of said roll; and

c) removing said roll from said process chamber after completion of said chemical vapor deposition process.

2. The method according to claim 1, wherein the thickness of said outer spacer strips varies along the length thereof to provide a controlled variation in the distance between adjacent layers of said roll from the innermost layer to the outermost layer.

3. The method according to claim 1, wherein said roll further includes an intermediate spacer strip extending through each of said consecutive layers and located between said outer spacer strips.

4. The method according to claim 1, wherein said roll further includes a stiffener extending along the the edges of each of said consecutive layers.

5. The method according to claim 4, wherein said roll further includes an extended second substrate, and wherein said stiffener is sandwiched between said first and second substrates.

6. The method according to claim 1, wherein said substrate is rolled on an internal support tube.

7. The method according to claim 6, wherein said spacer strips and internal support tube are formed of materials which are substantially inert to said chemical vapor deposition process.

8. The method according to claim 1, comprising the further step of:

mechanically securing the outermost layer of said roll to the remainder of said roll to prevent said roll from unwinding during transport or processing.

9. The method according to claim 1, wherein the heating of said substrate during said chemical vapor deposition process is performed near or below atmospheric pressure.

10. The method according to claim 1, comprising the further steps of:

unwinding said substrate;

providing a catalytically-active film on at least one side of said substrate; and

rewinding said substrate and said outer spacer strips to provide said first remounted substrate roll.

11. The method according to claim 1, wherein said substrate is formed by providing a catalytically-active film on at least one side of a metal foil.

12. The method according to claim 11, wherein said metal foil is formed primarily of stainless steel, nickel or copper, and wherein said catalytically-active film has a structure selected from the group consisting of single layer, multi-layer, homogenous layer and graduated layer, and wherein each said layer of said film has a function selected from the group consisting of catalytically-active layer, barrier layer, adhesion promotion layer and spacer layer, and wherein at least one of said layers of said film is formed by e-beam deposition, spattering, liquid processing, thermal spray, plasma spray, thermal oxidation, chemical reaction, or CVD processing, and wherein at least one of said layers of said film includes elements selected from the group consisting of Au, Pt, Fe, Ni, Co, Mo, Cr, Ti, Cu, SiO₂, SiO_x, Al₂O₃, Al₂O_x or respective alloys and material combinations thereof.

13. The method according to claim 12, wherein said processing step includes the further steps of a) supplying a hydrocarbon containing precursor gas, and b) synthesizing nanotubes on said first substrate.

14. The method according to claim 12, wherein said processing step includes the further steps of a) supplying at least one precursor selected from the group consisting of SiH₄, HSiCl3, H₂SiCl₂ and SiCl₄, and b) synthesizing nanowires on said first substrate.

15. The method according to claim 1, wherein said first substrate is steel foil;

and

wherein said processing step provides a thin film on said substrate for increased corrosion resistance.

16. The method according to claim 1, wherein said substrate is rolled on a support tube;

and

wherein said chemical vapor deposition synthesis system includes a transfer arm for receiving said support tube.

17. The method according to claim 1, further comprising the step of positioning a second remounted substrate roll into said primary reaction chamber.

18. The method according to claim 17, wherein said first and second rolls are rolled on a support tube, and wherein said chemical vapor deposition synthesis system includes a transfer arm for receiving said support tube.

19. The method according to claim 1, further comprising a support tube having a porous support plate at one end and a handle at the other end, said remounted substrate roll being wound on said support tube;

and

wherein said primary reaction chamber is vertically-oriented and includes a support table; and

wherein said support tube is loaded into said chamber such that said support plate rests on said support table.

20. A remounted substrate roll, comprising:

a rolled-up flexible substrate forming an Archimedes spiral and defining a plurality of consecutive layers, said substrate having at least one catalytically-active surface and defining a width W, a length L and a thickness T, wherein T<

<

W<

<

L; and

at least two outer spacer strips, said outer spacer strips being located between each of said consecutive layers of said roll and near the edges of the width of said substrate, said outer spacer strips being formed of a material which is substantially open thus permitting substantially uninhibited process gas exchange between the internal and external volume of said roll.