×

Method and System of Creating a Symmetrical FIB Deposition

  • US 20150369710A1
  • Filed: 10/27/2014
  • Published: 12/24/2015
  • Est. Priority Date: 06/24/2014
  • Status: Abandoned Application
First Claim
Patent Images

1. A method of forming a TEM sample lamella having a uniform deposition using a focused ion beam comprisingdirecting a focused ion beam toward a work piece surface at an angle of greater than 30 degrees from a surface normal, the charged particles having a landing energy of 10 keV or less;

  • providing a carbon precursor gas at the impact point of the charged particle beam, the carbon precursor gas decomposing in the presence of the ion beam to deposit carbon onto the work piece; and

    directing a focused ion beam toward the deposited material on the work piece to remove material from both sides of a region of interest to leave a thin lamella containing the region of interest, the deposited carbon protecting the thin lamella during formation.

View all claims
  • 0 Assignments
Timeline View
Assignment View
    ×
    ×