METHOD FOR MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD FOR MANUFACTURING REFLECTIVE MASK
First Claim
1. A method of manufacturing a reflective mask blank comprising a multilayer reflective film formed on a substrate so as to reflect EUV light;
- and a laminated film formed on the multilayer reflective film;
the method comprising the steps of;
depositing the multilayer reflective film on the substrate to form a multilayer reflective film formed substrate;
carrying out defect inspection for the multilayer reflective film formed substrate;
depositing the laminated film on the multilayer reflective film of the multilayer reflective film formed substrate;
forming a fiducial mark for an upper portion of the laminated film to thereby form a reflective mask blank comprising the fiducial mark, the fiducial mark serving as a reference for a defect position in defect information; and
carrying out defect inspection of the reflective mask blank by using the fiducial mark as a reference.
1 Assignment
0 Petitions
Accused Products
Abstract
A method of manufacturing a reflective mask blank comprising a multilayer reflective film formed on a substrate so as to reflect EUV light; and a laminated film formed on the multilayer reflective film. The method includes the steps of depositing the multilayer reflective film on the substrate to form a multilayer reflective film formed substrate; carrying out defect inspection for the multilayer reflective film formed substrate; depositing the laminated film on the multilayer reflective film of the multilayer reflective film formed substrate; forming a fiducial mark for an upper portion of the laminated film to thereby form a reflective mask blank comprising the fiducial mark, the fiducial mark serving as a reference for a defect position in defect information; and carrying out defect inspection of the reflective mask blank by using the fiducial mark as a reference.
17 Citations
18 Claims
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1. A method of manufacturing a reflective mask blank comprising a multilayer reflective film formed on a substrate so as to reflect EUV light;
- and a laminated film formed on the multilayer reflective film;
the method comprising the steps of; depositing the multilayer reflective film on the substrate to form a multilayer reflective film formed substrate; carrying out defect inspection for the multilayer reflective film formed substrate; depositing the laminated film on the multilayer reflective film of the multilayer reflective film formed substrate; forming a fiducial mark for an upper portion of the laminated film to thereby form a reflective mask blank comprising the fiducial mark, the fiducial mark serving as a reference for a defect position in defect information; and carrying out defect inspection of the reflective mask blank by using the fiducial mark as a reference. - View Dependent Claims (3, 4, 5, 6, 7, 8, 9, 10)
- and a laminated film formed on the multilayer reflective film;
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2. A method of manufacturing a reflective mask blank comprising a multilayer reflective film formed on a substrate so as to reflect EUV light;
- and an absorber film formed on the multilayer reflective film so as to absorb the EUV light;
the method comprising the steps of; depositing the multilayer reflective film on the substrate to form a multilayer reflective film formed substrate; carrying out defect inspection for the multilayer reflective film formed substrate; depositing the absorber film on the multilayer reflective film of the multilayer reflective film formed substrate; forming a fiducial mark for the absorber film to thereby form a reflective mask blank comprising the fiducial mark, the fiducial mark serving as a reference for a defect position in defect information; and carrying out defect inspection for the reflective mask blank by using the fiducial mark as a reference. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18)
- and an absorber film formed on the multilayer reflective film so as to absorb the EUV light;
Specification