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METHOD FOR MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD FOR MANUFACTURING REFLECTIVE MASK

  • US 20160004153A1
  • Filed: 02/20/2014
  • Published: 01/07/2016
  • Est. Priority Date: 02/22/2013
  • Status: Active Grant
First Claim
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1. A method of manufacturing a reflective mask blank comprising a multilayer reflective film formed on a substrate so as to reflect EUV light;

  • and a laminated film formed on the multilayer reflective film;

    the method comprising the steps of;

    depositing the multilayer reflective film on the substrate to form a multilayer reflective film formed substrate;

    carrying out defect inspection for the multilayer reflective film formed substrate;

    depositing the laminated film on the multilayer reflective film of the multilayer reflective film formed substrate;

    forming a fiducial mark for an upper portion of the laminated film to thereby form a reflective mask blank comprising the fiducial mark, the fiducial mark serving as a reference for a defect position in defect information; and

    carrying out defect inspection of the reflective mask blank by using the fiducial mark as a reference.

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