DESIGN OF SUSCEPTOR IN CHEMICAL VAPOR DEPOSITION REACTOR
First Claim
1. An apparatus, comprising:
- a susceptor; and
a substrate support ring disposed on a surface of the susceptor, wherein the substrate support ring has a first surface for receiving a substrate and a second surface opposite the first surface, wherein the second surface has at least three protrusions, each protrusion has a tip, and each tip is in contact with the susceptor.
1 Assignment
0 Petitions
Accused Products
Abstract
Embodiments described herein generally relate to an apparatus for depositing materials on a substrate. The apparatus includes a substrate support assembly. The substrate support assembly includes a susceptor and a substrate support ring disposed on the susceptor. The substrate support ring has a first surface for receiving the substrate and a second surface opposite the first surface. The second surface includes at least three protrusions and each protrusion has a tip that is in contact with the susceptor. The substrate support ring is comprised of a material having poor thermal conductivity, and the contact area between the substrate support ring and the susceptor is minimized, resulting in minimum unwanted heat conduction from the susceptor to the edge of the substrate.
175 Citations
20 Claims
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1. An apparatus, comprising:
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a susceptor; and a substrate support ring disposed on a surface of the susceptor, wherein the substrate support ring has a first surface for receiving a substrate and a second surface opposite the first surface, wherein the second surface has at least three protrusions, each protrusion has a tip, and each tip is in contact with the susceptor. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. An apparatus, comprising:
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a chamber body; and a substrate support assembly disposed in the chamber body, wherein the substrate support assembly comprises; a susceptor; and a substrate support ring disposed on a surface of the susceptor, wherein the substrate support ring has a first surface for receiving a substrate and a second surface opposite the first surface, wherein the second surface has at least three protrusions, each protrusion has a tip, and each tip is in contact with the susceptor. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 17)
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18. An apparatus, comprising:
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a susceptor having a surface, wherein at least three recesses are formed in the surface of the susceptor; and a substrate support ring disposed on the surface of the susceptor, wherein the substrate support ring has a first surface for receiving a substrate and a second surface opposite the first surface, wherein the second surface has at least three protrusions, each protrusion has a tip, and each tip is placed in a corresponding recess of the at least three recesses. - View Dependent Claims (19, 20)
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Specification