COVER GLASS AND METHOD FOR MANUFACTURING SAME

• US 20160016845A1
• Filed: 11/29/2013
• Published: 01/21/2016
• Est. Priority Date: 03/05/2013
• Status: Abandoned Application

• Current Assignee: Crucialtec Co., Ltd
• Original Assignee: Crucialtec Co., Ltd
• Inventors: Cho, Hyung Sik, Ji, Yong Hyun
• Application Number:
  US14/773,620
• Publication Number:
  US 20160016845A1
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: C03C 15/00 Surface treatment of glass, not in the form of fibres or filaments, by etching etching or surface-brightening compositions, in general C09K13/00
• CPC Class Codes: C03C 17/3417 all coatings being oxide coatings
• CPC Class Codes: C03C 2217/73 Anti-reflective coatings with specific characteristics
• CPC Class Codes: C03C 2218/34 Masking
• CPC Class Codes: G03F 7/20 Exposure; Apparatus therefor photographic printing apparatus for making copies G03B27/00
• CPC Class Codes: G03F 7/32 Liquid compositions therefor, e.g. developers
• CPC Class Codes: G06F 1/1626 with a single-body enclosure integrating a flat display, e.g. Personal Digital Assistants [PDAs]
• CPC Class Codes: G06F 1/1637 Details related to the display arrangement, including those related to the mounting of the display in the housing
• CPC Class Codes: G06F 1/181 Enclosures for portable computers G06F1/1613

Abstract

An embodiment of the present invention provides a cover glass which is slim and gives a better aesthetic feeling, and a method for manufacturing the same. The cover glass according to an embodiment of the present invention comprises: a glass substrate; a pattern portion formed on the glass substrate by etching; and a multi-layered thin film coated on the surface of the pattern portion.

Claims

1. A cover glass comprising:

a glass substrate;

a pattern portion formed in the glass substrate by etching; and

a multi-layered thin film coated on a surface of the pattern portion.

2. The cover glass of claim 1, wherein the surface of the pattern portion is formed as an inner surface of the glass substrate.

3. The cover glass of claim 1, wherein the pattern portion is formed in a bezel area of the glass substrate.

4. The cover glass of claim 1, further comprising a print unit formed to cover the multi-layered thin film.

5. A method for manufacturing a cover glass, comprising:

masking a glass substrate with an acid-resistant photoresist ink; and

etching the glass substrate with a non-hydrofluoric acid-based etchant to form a pattern portion.

6. The method of claim 5, wherein the etching in the etching of the glass substrate with the non-hydrofluoric acid-based etchant to form the pattern portion is performed in a bezel area of the glass substrate.

7. The method of claim 5, wherein the masking of the glass substrate with the acid-resistant photoresist ink comprises:

applying the acid-resistant photoresist ink onto the glass substrate to a thickness of 10 to 20 μ

m;

arranging a mask pattern on a top surface of a resist film to which the acid-resistant photoresist ink is applied, and exposing the mask pattern; and

developing the exposed pattern formed in the resist film.

8. The method of claim 5, wherein the etching in the etching of the glass substrate with the non-hydrofluoric acid-based etchant to form the pattern portion is performed by finely bubbling the non-hydrofluoric acid-based etchant.

9. The method of claim 5, wherein the non-hydrofluoric acid-based etchant comprises 50 to 300 g/L of ammonium fluoride, 1 to 30 g/L of an amine-based compound, 0.1 to 5 g/L of an anionic surfactant, and water.

10. The method of claim 9, wherein the amine-based compound comprises at least one selected from the group consisting of monoethylamine, diethylamine, and triethylamine.

11. The method of claim 9, wherein the anionic surfactant comprises alkylbenzene sulfonate or sodium lauryl sulfate.

12. A method for manufacturing a cover glass, comprising:

masking a glass substrate;

etching the glass substrate to form a pattern portion; and

coating the pattern portion with a multi-layered thin film.

13. The method of claim 12, wherein the masking of the glass substrate is performed using an acid-resistant photoresist ink, and the etching of the glass substrate to form the pattern portion is performed using a non-hydrofluoric acid-based etchant.

14. The method of claim 13, wherein the masking of the glass substrate comprises:

applying the acid-resistant photoresist ink to the glass substrate to a thickness of 10 to 20 μ

m;

arranging a mask pattern on a top surface of a resist film to which the acid-resistant photoresist ink is applied, and exposing the mask pattern; and

developing the exposed pattern formed in the resist film.

15. The method of claim 13, wherein the etching in the etching of the glass substrate to form the pattern portion is performed by finely bubbling the non-hydrofluoric acid-based etchant.

16. The method of claim 13, wherein the non-hydrofluoric acid-based etchant comprises 50 to 300 g/L of ammonium fluoride, 1 to 30 g/L of an amine-based compound, 0.1 to 5 g/L of an anionic surfactant, and water.

17. The method of claim 16, wherein the amine-based compound comprises at least one selected from the group consisting of monoethylamine, diethylamine, and triethylamine.

18. The method of claim 16, wherein the anionic surfactant comprises alkylbenzene sulfonate or sodium lauryl sulfate.

19. The method of claim 12, wherein the multi-layered thin film is formed by stacking at least one selected from the group consisting of a titanium oxide layer, and a silicon oxide layer.

20. The method of claim 12, wherein the etching in the etching of the glass substrate to form the pattern portion is performed in a bezel area of the glass substrate.

21. The method of claim 12, wherein, after the etching of the glass substrate to form the pattern portion, a fingerprint-resistant/anti-reflective thin film coating layer is further formed to a thickness of 1,500 to 8,000 Å

on a rear surface of the glass substrate on which the pattern portion is formed.

22. The method of claim 12, further comprising, after the coating of the pattern portion with the multi-layered thin film:

forming a print unit to cover the multi-layered thin film.