THERMIONICALLY-OVERDRIVEN TUNNEL FETS AND METHODS OF FABRICATING THE SAME
First Claim
1. A field effect transistor (FET), comprising:
- a nanosheet stack comprising first and second stacked semiconductor channel layers, the first channel layer defining a channel region of a tunnel FET, and the second channel layer defining a channel region of a thermionic FET; and
source and drain regions on opposite sides of the nanosheet stack such that the first and second channel layers extend therebetween, wherein a first portion of the source region adjacent the first channel layer and a second portion of the source region adjacent the second channel layer have opposite semiconductor conductivity types.
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Abstract
A field effect transistor (FET) includes a nanosheet stack having first and second stacked semiconductor channel layers. The first channel layer defines a channel region of a tunnel FET, and the second channel layer defines a channel region of a thermionic FET. Source and drain regions are provided on opposite sides of the nanosheet stack such that the first and second channel layers extend therebetween. A first portion of the source region adjacent the first channel layer and a second portion of the source region adjacent the second channel layer have opposite semiconductor conductivity types. Related fabrication and operating methods are also discussed.
135 Citations
24 Claims
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1. A field effect transistor (FET), comprising:
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a nanosheet stack comprising first and second stacked semiconductor channel layers, the first channel layer defining a channel region of a tunnel FET, and the second channel layer defining a channel region of a thermionic FET; and source and drain regions on opposite sides of the nanosheet stack such that the first and second channel layers extend therebetween, wherein a first portion of the source region adjacent the first channel layer and a second portion of the source region adjacent the second channel layer have opposite semiconductor conductivity types. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A method of fabricating a field effect transistor (FET), the method comprising:
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providing a nanosheet stack comprising first and second stacked semiconductor channel layers, the first channel layer defining a channel region of a tunnel FET, and the second channel layer defining a channel region of a thermionic FET; and forming source and drain regions on opposite sides of the nanosheet stack such that the first and second channel layers extend therebetween, wherein a first portion of the source region adjacent the first channel layer and a second portion of the source region adjacent the second channel layer have opposite semiconductor conductivity types. - View Dependent Claims (17, 18, 19, 20)
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21. A method of operating a field-effect transistor (FET), the method comprising:
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applying a first supply voltage to a gate electrode extending between first and second stacked semiconductor channel layers in a first operating mode, the first and second channel layers extending between a drain region and a source region including portions of opposite semiconductor conductivity types, wherein the first supply voltage is sufficient to cause conduction in the first channel layer but is insufficient to cause significant conduction in the second channel layer; and applying a second supply voltage to the gate electrode in a second operating mode, wherein the second supply voltage is sufficient to cause conduction in the second channel layer that is substantially greater than the conduction in the first channel layer. - View Dependent Claims (22, 23, 24)
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Specification