DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME
First Claim
1. A display device, comprising:
- a first base substrate;
a thin film transistor disposed on the first base substrate that includes a semiconductor layer, a gate electrode, a source electrode, and a drain electrode;
a first passivation layer that covers the thin film transistor and that includes an inorganic insulating material;
a second passivation layer disposed on the first passivation layer that includes an exposure hole exposing the first passivation layer on the drain electrode;
a common electrode disposed on the second passivation layer;
a third passivation layer that covers the common electrode and that includes a contact hole disposed inside the exposure hole exposing the drain electrode;
a cavity between the first passivation layer and the third passivation layer on the drain electrode; and
a pixel electrode disposed on the third passivation layer and connected with the drain electrode.
1 Assignment
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Accused Products
Abstract
An array substrate for a display device includes a first base substrate; a thin film transistor disposed on the first base substrate that includes a semiconductor layer, a gate electrode, a source electrode, and a drain electrode; a first passivation layer that covers the thin film transistor and that includes an inorganic insulating material; a second passivation layer disposed on the first passivation layer that includes an exposure hole that exposes the first passivation layer on the drain electrode; a common electrode disposed on the second passivation layer; a third passivation layer that covers the common electrode and that includes a contact hole inside the exposure hole to expose the drain electrode; a cavity between the first passivation layer and the third passivation layer on the drain electrode; and a pixel electrode disposed on the third passivation layer and connected with the drain electrode.
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Citations
20 Claims
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1. A display device, comprising:
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a first base substrate; a thin film transistor disposed on the first base substrate that includes a semiconductor layer, a gate electrode, a source electrode, and a drain electrode; a first passivation layer that covers the thin film transistor and that includes an inorganic insulating material; a second passivation layer disposed on the first passivation layer that includes an exposure hole exposing the first passivation layer on the drain electrode; a common electrode disposed on the second passivation layer; a third passivation layer that covers the common electrode and that includes a contact hole disposed inside the exposure hole exposing the drain electrode; a cavity between the first passivation layer and the third passivation layer on the drain electrode; and a pixel electrode disposed on the third passivation layer and connected with the drain electrode. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method of fabricating a display device, comprising:
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forming a thin film transistor on a first base substrate; forming a first passivation layer on the first base substrate that covers the thin film transistor, wherein the first passivation layer includes an inorganic insulating material; forming a second passivation layer on the first passivation layer; patterning the second passivation layer to form an exposure hole that exposes the first passivation layer on a drain electrode of the thin film transistor; forming a common electrode on the second passivation layer, wherein the common electrode includes a transparent conductive oxide; forming a third passivation layer on the common electrode; patterning the third passivation layer to expose the common electrode on the drain electrode etching the common electrode to form a cavity between the first passivation layer and the third passivation layer on the drain electrode; patterning the first passivation layer to expose the drain electrode; and forming a pixel electrode connected to the drain electrode on the third passivation layer. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17)
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18. An array substrate, comprising:
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a thin film transistor disposed on a first base substrate; a first passivation layer that covers the thin film transistor; a second passivation layer disposed on the first passivation layer that includes an exposure hole with an inclined internal lateral surface that exposes the first passivation layer on a drain electrode of the thin film transistor; a common electrode disposed on the second passivation layer that extends into the internal lateral surface of the exposure hole; a third passivation layer that covers the common electrode and that includes a contact hole disposed inside the exposure hole exposing the drain electrode; a cavity between the first passivation layer and the third passivation layer on the drain electrode; and a pixel electrode disposed on the third passivation layer and connected with the drain electrode, wherein the cavity separates the common electrode and the pixel electrode. - View Dependent Claims (19, 20)
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Specification