ELECTRODE STRUCTURE AND OLED DISPLAY

• US 20160028040A1
• Filed: 04/08/2015
• Published: 01/28/2016
• Est. Priority Date: 07/22/2014
• Status: Abandoned Application

• Current Assignee: Everdisplay Optonics (Shanghai) Limited
• Original Assignee: Everdisplay Optonics (Shanghai) Limited
• Inventors: LEE, Wei-meng, YU, Kuo-cheng, LU, Chun-chung, CHEN, Hung-shun
• Application Number:
  US14/681,741
• Publication Number:
  US 20160028040A1
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: H01B 1/02 mainly consisting of metals or alloys
• CPC Class Codes: H10K 50/816 Multilayers, e.g. transparent multilayers
• CPC Class Codes: H10K 59/80517 Multilayers, e.g. transparent multilayers

Abstract

The embodiments of the present disclosure relate to an electrode structure and OLED display. The electrode structure includes a first electrode layer, a second electrode layer and a third electrode layer. The first electrode layer includes at least one layer from Ti layer, Ti alloy layer, Zr layer and Zr alloy layer. The second electrode layer is formed on the first electrode layer. The third electrode layer is formed on the second electrode layer and includes at least one layer from Ti layer, Ti alloy layer, Zr layer and Zr alloy layer. The present disclosure saves massive rare metal indium, which can help to reduce the manufacture cost of OLED display. Meanwhile, it is not prone to delamination, rupture, exfoliation and so on at the first and third electrode layers, and thusly reduced light scattering due to Ti, Ti alloy, Zr or Zr alloy with good corrosion resistance.

Claims

1. An electrode structure comprising:

a first electrode layer comprising at least one layer selected from the group consisting of Ti layer, Ti alloy layer, Zr layer and Zr alloy layer;

a second electrode layer formed on the first electrode layer; and

a third electrode layer formed on the second electrode layer and comprising at least one layer selected from the group consisting of Ti layer, Ti alloy layer, Zr layer and Zr alloy layer.

2. The electrode structure according to claim 1, wherein the first and the third electrode layers are composed of the same material.

3. The electrode structure according to claim 2, wherein both the first electrode layer and the third electrode layer are Ti layer or Zr layer.

4. The electrode structure according to claim 3, wherein the second electrode layer is Ag layer or Ag alloy layer.

5. The electrode structure according to claim 1, wherein the thickness of the first electrode layer plus the thickness of the third electrode layer is not less than 80% of the total thickness of the electrode structure.

6. The electrode structure according to claim 2, wherein the thickness of the first electrode layer plus the thickness of the third electrode layer is not less than 80% of the total thickness of the electrode structure.

7. The electrode structure according to claim 3, wherein the thickness of the first electrode layer plus the thickness of the third electrode layer is not less than 80% of the total thickness of the electrode structure.

8. The electrode structure according to claim 7, wherein the thickness of the first electrode layer ranges from 10-100 nm, the thickness of the second electrode layer ranges from 2-20 nm, and the thickness of the third electrode layer ranges from 10-100 nm.

9. The electrode structure according to claim 1, wherein the Zr alloy layer is at least one layer selected from the group consisting of V—

Zr alloy layer, Zr—

Ni alloy layer, Al—

Zr alloy layer, Mg—

Zr alloy layer and Si—

Zr alloy layer.

10. The electrode structure according to claim 1, wherein the Ti alloy layer is at least one layer selected from the group consisting of Ti—

Al—

V alloy, Ti—

Al—

Sn alloy, Ti—

Al—

Zr alloy, Ti—

Mo alloy, Ti—

Mo—

Ni alloy and Ti—

Pd alloy.

11. The electrode structure according to claim 1, wherein the electrode structure is used as anode of OLED.

19. The OLED display according to claim 1, wherein the Zr alloy layer is at least one layer selected from the group consisting of V—

Zr alloy layer, Zr—

Ni alloy layer, Al—

Zr alloy layer, Mg—

Zr alloy layer and Si—

Zr alloy layer.

20. The OLED display according to claim 1, wherein the Ti alloy layer is at least one layer selected from the group consisting of Ti—

Al—

V alloy, Ti—

Al—

Sn alloy, Ti—

Al—

Zr alloy, Ti—

Mo alloy, Ti—

Mo—

Ni alloy and Ti—

Pd alloy.

12. An OLED display comprising:

a substrate,

an upper electrode located on the substrate;

an organic layer located on the upper electrode; and

a lower electrode located on the organic layer;

the upper electrode or lower electrode is used as an anode, and the anode comprising;

a first electrode layer comprising at least one layer selected from the group consisting of Ti layer, Ti alloy layer, Zr layer and Zr alloy layer;

a second electrode layer formed on the first electrode layer; and

a third electrode layer formed on the second electrode layer and comprising at least one layer selected from the group consisting of Ti layer, Ti alloy layer, Zr layer and Zr alloy layer.

13. The OLED display according to claim 12, wherein the first and the third electrode layers are composed of the same material.

14. The OLED display according to claim 13, wherein both the first electrode layer and the third electrode layer are Ti layer or Zr layer.

15. The OLED display according to claim 14, wherein the second electrode layer is Ag layer or Ag alloy layer.

16. The OLED display according to claim 12, wherein the thickness of the first electrode layer plus the thickness of the third electrode layer is not less than 80% of the total thickness of the electrode structure.

17. The OLED display according to claim 13, wherein the thickness of the first electrode layer plus the thickness of the third electrode layer is not less than 80% of the total thickness of the electrode structure.

18. The OLED display according to claim 17, wherein the thickness of the first electrode layer ranges from 10-100 nm, the thickness of the second electrode layer ranges from 2-20 nm, and the thickness of the third electrode layer ranges from 10-100 nm.